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<p class="MsoNormal"><span style="mso-fareast-language:EN-US">Hi Matthias,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-US">Like others have responded, we see a lot of C contamination in the chamber after DC sputtering of a graphite target. We allow it on an older system and cover the other targets while
C is installed. After deposition of C we immediately clean the chamber. So for us it requires extra resources compared to other materials. We haven’t had any user complaints about cross-contamination. Our system is mostly used otherwise to sputter metals,
Si and a few dielectrics, always at room temperature.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-US">Before trying out C-deposition ourselves, we asked out on the Basecamp network of Nordic cleanrooms for experience. We got the reply from Chalmers that they get the very best results
with PLD in a dedicated chamber and that they use e-beam evaporation for larger substrates, but it’s not ideal. From Uppsala we heard that they used to have a dedicated chamber for DC sputtering of carbon and found it difficult to get the films as dense as
they had hoped.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-US">Best of luck and best regards,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-US">Rebecca Ettlinger<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-US">Nanolab, Technical University of Denmark<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Matthias Pleil<br>
<b>Sent:</b> 17. juli 2024 04:19<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] Carbon Targets in Sputter<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:black">Hello LabNetwork folks,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:black">I have a user that wishes to use a carbon target in our sputter tool. I have a couple of questions:<o:p></o:p></span></p>
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<span style="font-family:"Arial",sans-serif">What, if any, concerns should we have regarding cross-contamination. We typically use the sputter tool for metals and dielectrics.<o:p></o:p></span></li></ol>
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<span style="font-family:"Arial",sans-serif">Any suggestions, lessons learned if you have used such targets in the past.<o:p></o:p></span></li></ol>
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<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:black">Greatly appreciate any input you can provide. Thanks!<o:p></o:p></span></p>
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<p class="MsoNormal" style="background:white"><span style="font-size:14.0pt;font-family:"Arial",sans-serif;color:black">Kind Regards,
<o:p></o:p></span></p>
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<p class="MsoNormal" style="background:white"><span style="font-family:"Calibri",sans-serif;color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal" style="background:white"><span style="font-size:14.0pt;font-family:"Arial",sans-serif;color:black">Matthias Pleil, Ph.D.<o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><span style="font-size:14.0pt;font-family:"Arial",sans-serif;color:black">Director Manufacturing Engineering Program<o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><span style="font-size:14.0pt;font-family:"Arial",sans-serif;color:black;background:white">UNM MTTC Cleanroom Manager</span><span style="font-size:14.0pt;font-family:"Arial",sans-serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><span style="font-size:14.0pt;font-family:"Arial",sans-serif;color:black">Research Professor & Senior Lecturer III of Mech. Eng - UNM<o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><span style="font-size:14.0pt;font-family:"Arial",sans-serif;color:black">PI - NSF Support Center for Microsystems Education<o:p></o:p></span></p>
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