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Hello Lab network!</div>
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We have a user that is interested in etching a CVD grown slab of Diamond (Area: 3mmx3mm) about ~300 um thick via CF4/O2 or SF6 plasma (CF4 process described here-</div>
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<a href="https://urldefense.com/v3/__https://www.sciencedirect.com/science/article/abs/pii/S0925963501006173__;!!GekbXoL5ynDpFgM!WxaE7hfA6-iCIfo3iRBj8F1Agt1XD-R1rG2Erff2xgbqNr8azLuLPVme0Bu1-MPWWvbxOATSjMfwV6cW23nVbunPXr7k$" target="_blank" id="OWAa6dd056b-6b1e-249d-abb6-41104571feb0" class="OWAAutoLink" title="Original URL: https://urldefense.com/v3/__https://www.sciencedirect.com/science/article/abs/pii/S0925963501006173__;!!GekbXoL5ynDpFgM!WxaE7hfA6-iCIfo3iRBj8F1Agt1XD-R1rG2Erff2xgbqNr8azLuLPVme0Bu1-MPWWvbxOATSjMfwV6cW23nVbunPXr7k$. Click or tap if you trust this link." rel="noopener noreferrer" shash="CFDZizbY6VmY/newDDNmDBfx4pHpYV2DbF22p2BlPoXwjQD6mICt7QZYuIl/IvGqrAGiLmbROQMA3rT6EqnVA3/cQQ6GCkFwD7K24c8DE5Y2nhGhT/asQqqsjw5bLO3kzMDs0cT4SXCzNb0HLvBzeOcUGa3QkpEiYRiafkjJ2u4=" originalsrc="https://urldefense.com/v3/__https://www.sciencedirect.com/science/article/abs/pii/S0925963501006173__;!!GekbXoL5ynDpFgM!WxaE7hfA6-iCIfo3iRBj8F1Agt1XD-R1rG2Erff2xgbqNr8azLuLPVme0Bu1-MPWWvbxOATSjMfwV6cW23nVbunPXr7k$" data-auth="Verified" data-linkindex="0" style="margin: 0px;">https://www.sciencedirect.com/science/article/abs/pii/S0925963501006173</a> ,
though they would use a SiO2/ PMMA instead of Al mask and an ICP instead of an RIE).</div>
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Here is what I have read on diamond so far:</div>
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There is no precedent category for Carbon or diamond in the Cornell CNF materials categories (though SiC was allowed in even the most restricted tools) or in labnetwork. The sputter yield should be very low (~0.2 with Xe at 750ev- though most of the other values
we have for comparison were with Ar at 600eV) and I could not find a vapor pressure curve for it. MP/BP at atmosphere is absurdly high (in the thousands) and I don't think the etch temperature would be hot enough for it to degrade to graphite. (Actually- I
don't even know if our etcher will get hot enough to prompt the fluorine reaction based on literature, but apparently it has been etched before.) Not a toxic material. We might get HF vapor as a side product but usually figure scrubbers can handle that without
further risk or precautions.<br>
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Do any facilities out there have experience plasma etching CVD diamond? What level-of-cleanliness tool did you allow it in? Were there any contamination problems (especially relevant to waveguides) or other safety aspects I should be aware of? What cleaning
recipe did you use?</div>
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Thanks,</div>
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Emma</div>
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<b>_____________________________________________</b></div>
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<b>Emma Anquillare, PhD</b></div>
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Research Scientist</div>
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<span style="font-size: 12pt;">ASRC </span><span style="font-size: 16px; background-color: rgb(255, 255, 255);">Nanofabrication Facility</span></div>
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<span style="background-color: rgb(255, 255, 255);">City University of New York</span></div>
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<i>Catalyzing Change, Celebrating Gains: </i></div>
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