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<p class="MsoNormal"><span style="font-family:"Aptos",sans-serif">Hi Golan,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Aptos",sans-serif"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Aptos",sans-serif">We have a Si 500 etch tool here at Harvard, Center for Nanoscale Systems. We installed it in April 2024. The user purchased it for our center and it is only to be used for diamond etching. After
1 year it will be opened to all users and we may open it up to other processes. They hardly use it and so I cannot tell you how it performs or it’s reliability. So far so good. It seems to be a well made and designed system. I wish we would start running it
so I would know the answer to these questions myself. <o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Aptos",sans-serif"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Aptos",sans-serif">Regards,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.5pt;color:black;mso-ligatures:none"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.5pt;color:black;mso-ligatures:none">David LaFleur<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.5pt;color:black;mso-ligatures:none">Equipment Engineer <o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.5pt;color:black;mso-ligatures:none">CNS, Harvard University<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.5pt;color:black;mso-ligatures:none">11 Oxford St.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.5pt;color:black;mso-ligatures:none">Cambridge, Ma. 02138<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:10.5pt;color:black;mso-ligatures:none">6174857366<o:p></o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:12.0pt;color:black;mso-ligatures:none">From:
</span></b><span style="font-size:12.0pt;color:black;mso-ligatures:none">"labnetwork-bounces@mtl.mit.edu" <labnetwork-bounces@mtl.mit.edu> on behalf of Golan Tanami <golant@savion.huji.ac.il><br>
<b>Date: </b>Monday, November 18, 2024 at 7:54 AM<br>
<b>To: </b>"labnetwork@mtl.mit.edu" <labnetwork@mtl.mit.edu><br>
<b>Subject: </b>[labnetwork] Sentech GmbH ICP-RIE etch and ICP-CVD tools<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0">Dear Labnetwork,
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0">I was wondering if any of you has an experience with these tools (SI500 and SI500 D).
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0">More specifically, please relate to their long-term reliability and their remote-support service in case needed.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0">Best regards,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0">Golan.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black">Golan A. Tanami, PhD</span></b><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black">
<b>| </b>Head of the Unit for Nanofabrication (UNF)<o:p></o:p></span></p>
<p class="MsoNormal"><b><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black"><o:p> </o:p></span></b></p>
<p class="MsoNormal"><b><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black">Center for Nanoscience and Nanotechnology</span></b><b><span lang="HE" dir="RTL" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black"><o:p></o:p></span></b></p>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black">Edmond J. Safra Campus</span><span lang="HE" dir="RTL" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black"><br>
</span><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black">The Hebrew University of Jerusalem</span><span lang="HE" dir="RTL" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black"><br>
</span><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black">T +972.2.6584179 | M +972.50.9891111</span><span lang="HE" dir="RTL" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:#0070C0"><br>
</span><span lang="HE" dir="RTL" style="font-size:12.0pt;font-family:"Arial",sans-serif;color:#1F497D"><a href="mailto:golant@savion.huji.ac.il"><span lang="EN-US" dir="LTR" style="font-family:"Calibri",sans-serif;color:blue">golant</span><span lang="EN-US" dir="LTR" style="font-size:10.0pt;color:blue">@savion.huji.ac.il</span></a></span><span lang="AR-SA" dir="RTL" style="font-size:12.0pt;font-family:"Arial",sans-serif;color:#1F497D"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Website: <a href="https://urldefense.proofpoint.com/v2/url?u=https-3A__nano.huji.ac.il_UNF&d=DwMGaQ&c=WO-RGvefibhHBZq3fL85hQ&r=6eLRBFWstHA_77uCRuGQiAtV9vZWeQjYS4oSMBfEHZE&m=Vhbb1dtxEqu_9iXNGpkU13hFTtzelQvpC9XeeaCGr1wAD1-vP22KJRmS4svnoyV9&s=x8EF6bc-cwTwrRVg2oM9t0dHSwC4cv25fzniNp0ih30&e=">
<span style="color:blue">https://nano.huji.ac.il/UNF</span></a><o:p></o:p></span></p>
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