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<p>We have a SI500 etcher since late 2020 and use mostly fluorine
chemistry for diamond and silicon etching, although the machine is
specified to be Cl-compatible. The machine seems quite robust and
delivers very consistent performance over time. We had very little
trouble, even when moving the machine from a preliminary lab
installation (done by Sentech) to the final operational place,
where only the input chamber reaches through the clean-room wall.
Almost all problems we had turned out to be due to our limited
previous experience (i.e. user errors). The company always
supported us promptly and efficiently, we have zero complaints
there. This included "live" and offline remote technical
assistance as well as recipe support. <br>
</p>
<p>HTH, Wolfgang Harneit<br>
</p>
<div class="moz-cite-prefix">On 18.11.24 08:38, Golan Tanami wrote:<br>
</div>
<blockquote type="cite"
cite="mid:PAXPR10MB506986FDD811DF06F91D3BA6DE272@PAXPR10MB5069.EURPRD10.PROD.OUTLOOK.COM">
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<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0">Dear
Labnetwork,
<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0">I was
wondering if any of you has an experience with these tools
(SI500 and SI500 D).
<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0">More
specifically, please relate to their long-term reliability
and their remote-support service in case needed.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0">Best
regards,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0">Golan.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<table class="MsoNormalTable" border="0" cellspacing="0"
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src="cid:part1.ywO1Zk1g.wDaTwpoI@uos.de" class=""></span><span
style="color:#1F497D;mso-fareast-language:#2000"><o:p></o:p></span></p>
</td>
<td width="468" valign="top"
style="width:351.25pt;padding:0cm 5.4pt 0cm 5.4pt">
<p class="MsoNormal"><b><span
style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-fareast-language:#2000">Golan
A. Tanami, PhD</span></b><span
style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-fareast-language:#2000">
<b>| </b>Head of the Unit for Nanofabrication (UNF)<o:p></o:p></span></p>
<p class="MsoNormal"><b><span lang="HE" dir="RTL"
style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black;mso-fareast-language:#2000"><o:p> </o:p></span></b></p>
<p class="MsoNormal"><b><span
style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-fareast-language:#2000">Center
for Nanoscience and Nanotechnology<span lang="HE"
dir="RTL"><o:p></o:p></span></span></b></p>
<p class="MsoNormal"><span
style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-fareast-language:#2000">Edmond
J. Safra Campus<span lang="HE" dir="RTL"><br>
</span>The Hebrew University of Jerusalem<span
lang="HE" dir="RTL"><br>
</span>T +972.2.6584179 | M +972.50.9891111</span><span
lang="HE" dir="RTL"
style="font-size:10.0pt;font-family:"Arial",sans-serif;color:#0070C0;mso-fareast-language:#2000"><br>
</span><span lang="HE" dir="RTL"
style="font-size:12.0pt;font-family:"Arial",sans-serif;color:#1F497D;mso-fareast-language:#2000"><a
href="mailto:golant@savion.huji.ac.il"
moz-do-not-send="true"><span lang="EN-US"
dir="LTR"
style="font-family:"Calibri",sans-serif;color:blue">golant</span><span
lang="EN-US" dir="LTR"
style="font-size:10.0pt;color:blue">@savion.huji.ac.il</span></a></span><span
lang="EN-US"
style="font-size:12.0pt;font-family:"Arial",sans-serif;color:#1F497D;mso-fareast-language:#2000"><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"
style="color:#1F497D;mso-fareast-language:#2000">Website:
<a href="https://nano.huji.ac.il/UNF"
moz-do-not-send="true"><span style="color:blue">https://nano.huji.ac.il/UNF</span></a><o:p></o:p></span></p>
</td>
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</tbody>
</table>
<p class="MsoNormal"><span lang="EN-US"
style="color:#0070C0;mso-fareast-language:#2000"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="en-IL"><o:p> </o:p></span></p>
</div>
<br>
<fieldset class="moz-mime-attachment-header"></fieldset>
<pre wrap="" class="moz-quote-pre">_______________________________________________
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</pre>
</blockquote>
<pre class="moz-signature" cols="72">--
Prof. Dr. Wolfgang Harneit
Universität Osnabrück, Fachbereich Mathematik/Informatik/Physik
Institut für Physik, Barbarastr. 7, 49076 Osnabrück, Germany
<a class="moz-txt-link-abbreviated" href="http://www.quantum-spintronics.de">www.quantum-spintronics.de</a>, <a class="moz-txt-link-abbreviated" href="http://www.molecular-spintronics.de">www.molecular-spintronics.de</a></pre>
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