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Hello Esther<br>
<br>
Since you have a Fiji tool I would reach out to ALD support at
Veeco. Their recipe support is top notch and they can guide you on
HfO2 deposition. If you are using the standard Hafnia precursor
(TDMAHf) it is very sticky at low temperature. We discovered this
when a section of our jacket heater failed and the uniformity of the
film was horrible. And that was at 200C deposition temperature. I
can only imagine how non uniform and particulate forming that
precursor can be at 100C.<br>
<br>
Best regards,<br>
Brent<br>
-- <br>
Brent P. Gila, PhD.<br>
Associate Director, Research Service Centers<br>
University of Florida<br>
1041 Center Drive<br>
Gainesville, Florida 32611<br>
<a class="moz-txt-link-freetext" href="Tel:352-273-2245">Tel:352-273-2245</a>, Fax:352-846-2877<br>
email: <a class="moz-txt-link-abbreviated" href="mailto:bgila@ufl.edu">bgila@ufl.edu</a><br>
<br>
<br>
<div class="moz-cite-prefix">On 12/2/2024 10:49 AM, Abelev, Esta
wrote:<br>
</div>
<blockquote type="cite" cite="mid:MN2PR04MB632057F68B97246F6E538EBDC5352@MN2PR04MB6320.namprd04.prod.outlook.com">
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<div><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#FA4616"><b>[External
Email]</b></span>
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<p class="MsoNormal">Dear Colleagues, <o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">A group at our University is trying to
deposit HfO2 at low temperatures (80C and 100C) by ALD
techniques.<o:p></o:p></p>
<p class="MsoNormal">Currently, the group is using our Fiji200
instrument located in share user cleanroom, unfortunately we
have seen a lot of particulates after those depositions,
specially if the following user will deposit films at much
higher temperatures like 250C.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<ol style="margin-top:0in" start="1" type="1">
<li class="MsoListParagraph" style="margin-left:0in;mso-list:l0 level1 lfo1">If anyone
has an experience of low temp ALD depositions and can
advise on process conditions or some cleaning procedures,
we can implement to reduce post low temp particles. Please
advice.<o:p></o:p></li>
<li class="MsoListParagraph" style="margin-left:0in;mso-list:l0 level1 lfo1">Parallel
we are looking potentially purchasing a dedicated
instrument for low temp ALD deposition, if someone has an
advice on the instrument, please do? We were suggested
maybe to go with ANRIC Technologies tabletop unit, is
someone familiar with this vendor and their systems?<o:p></o:p></li>
</ol>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Best, Esta<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
</div>
</div>
<br>
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