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<div dir="auto">I believe the way it usually works is that you need heat conducting media at lower temperatures because radiation transfer isn't efficient.</div>
<div dir="auto">If you're talking 350 C, your radiation emission is roughly speaking (T1/T2)^4~ 15 times more efficient than at room temperature. Hence usually no heat transfer media up there. Can be dopant dependent for Si, though.</div>
<div dir="auto">If you really want to have some medium at high temperature, Indium and/or In-Ga eutectics work great - although they have their own set of problems. </div>
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<div dir="auto">Thanks </div>
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<div dir="auto">Mike</div>
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<div id="divRplyFwdMsg" dir="ltr"><font face="Calibri, sans-serif" style="font-size:11pt" color="#000000"><b>From:</b> labnetwork <labnetwork-bounces@mtl.mit.edu> on behalf of Gohmyeong Bae <gohmyeongbae@umass.edu><br>
<b>Sent:</b> Friday, January 3, 2025 9:58:00 AM<br>
<b>To:</b> labnetwork@mtl.mit.edu <labnetwork@mtl.mit.edu><br>
<b>Subject:</b> [labnetwork] Silicon based high temperature thermal grease</font>
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Dear Lab network,</div>
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We are looking for the high temperature silicon based thermal grease for the ICP/DEEP RIE etching system that can dissipate the heat on the back side of silicon wafer.</div>
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It should be covered in around Max. 660-degree Fahrenheit, which can properly applied into the ICP-RIE system either Oxford or other brand.</div>
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If you have any product information regarding this, please share to us.</div>
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Thank you.</div>
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Best,</div>
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Gohmyeong Bae.</div>
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