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Hi Joseph</div>
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We recently bought an ICP CVD from Plasma Therm (CORIAL version), and it comes with N2 and not NH3.</div>
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We have not received the tool yet.</div>
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Best</div>
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Christophe</div>
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<span style="font-family: Arial, sans-serif; font-size: 12pt; color: rgb(31, 73, 125);"><b><i>Christophe Clément</i></b></span></p>
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<span style="font-family: Arial, sans-serif; font-size: 10pt; color: gray;"><b>Professionnel de recherche</b></span></p>
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<span style="font-family: Arial, sans-serif; font-size: 8pt; color: gray;">Ecole Polytechnique de Montréal
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<span style="font-family: Arial, sans-serif; font-size: 8pt; color: gray;">Département de génie physique</span></p>
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<span style="font-family: Wingdings; font-size: 10pt; color: rgb(31, 73, 125);">(</span><span style="font-family: Arial, sans-serif; font-size: 8pt; color: rgb(51, 51, 51);"> </span><span style="font-family: Arial, sans-serif; font-size: 8pt; color: gray;">514
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<div id="divRplyFwdMsg" dir="ltr"><span style="font-family: Calibri, sans-serif; font-size: 11pt; color: rgb(0, 0, 0);"><b>De :</b> Joseph Losby <joseph.losby@ucalgary.ca><br>
<b>Envoyé :</b> 6 janvier 2025 13:32<br>
<b>À :</b> labnetwork@mtl.mit.edu <labnetwork@mtl.mit.edu><br>
<b>Objet :</b> [labnetwork] NH3 for silicon nitride deposition in ICP-CVD systems</span>
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Hello, </div>
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For those of you that operate a ICP chemical vapor deposition system for silicon nitride, do you use NH3 as one of your process gases or is N2 sufficient? My understanding is that the disassociation efficiency of N2 is much higher in ICP systems, so NH3 may
not be necessary. </div>
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Cheers,</div>
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Joe</div>
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<p style="text-align: left; margin: 0px;"><span style="font-family: Calibri, Calibri_EmbeddedFont, Calibri_MSFontService, sans-serif; font-size: 10pt; color: rgb(214, 0, 28); line-height: 17px;"><b>Joseph Losby, PhD</b></span></p>
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