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Thank you Travis,</div>
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This is great info. You mentioned the two systems we are considering.</div>
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Philippe</div>
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<div id="divRplyFwdMsg" dir="ltr"><font face="Calibri, sans-serif" style="font-size:11pt" color="#000000"><b>De :</b> Massey, Travis <massey21@llnl.gov><br>
<b>Envoyé :</b> 17 janvier 2025 20:20<br>
<b>À :</b> Philippe Mérel <Philippe.Merel@USherbrooke.ca>; labnetwork@mtl.mit.edu <labnetwork@mtl.mit.edu><br>
<b>Objet :</b> RE: Low temperature PECVD / ICP-CVD / Remote PECVD</font>
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<p class="x_MsoNormal"><span style="font-size:11.0pt; font-family:"Calibri",sans-serif">Hi Philippe,</span></p>
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<p class="x_MsoNormal"><span style="font-size:11.0pt; font-family:"Calibri",sans-serif">My users have not been successful in depositing waveguide-quality nitride at low temperatures.  We’re currently fixing some issues with our tool to increase the temperature. 
 That said, we are also still working through a slew of manufacturing defects on our PlasmaTherm Takachi HDPCVD system that have almost certainly been impacting film quality.  The promise of HDPCVD/ICPCVD (same thing, PlasmaTherm’s term versus Oxford’s term)
 is that good low-temperature films should be possible, but we’ve not seen this yet.  For what it’s worth, Oxford also failed to meet expectations when I requested a trial film.</span></p>
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<p class="x_MsoNormal"><span style="font-size:11.0pt; font-family:"Calibri",sans-serif">Are temperatures below 100 C strictly required for your application?</span></p>
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<p class="x_MsoNormal"><span style="font-size:11.0pt; font-family:"Calibri",sans-serif">Best,</span></p>
<p class="x_MsoNormal"><span style="font-size:11.0pt; font-family:"Calibri",sans-serif">Travis Massey</span></p>
<p class="x_MsoNormal"><span style="font-size:11.0pt; font-family:"Calibri",sans-serif">Center for Micro and Nano Technology (CMNT)</span></p>
<p class="x_MsoNormal"><span style="font-size:11.0pt; font-family:"Calibri",sans-serif">Lawrence Livermore National Laboratory</span></p>
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<p class="x_MsoNormal"><b><span style="font-size:11.0pt; font-family:"Calibri",sans-serif">From:</span></b><span style="font-size:11.0pt; font-family:"Calibri",sans-serif"> labnetwork <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Philippe Mérel<br>
<b>Sent:</b> Friday, January 17, 2025 12:52 PM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] Low temperature PECVD / ICP-CVD / Remote PECVD</span></p>
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<p class="x_MsoNormal"><span style="color:black">Can you share your experience if you are depositing silicon nitride and / or silicon oxide thin films at low substrate temperature (below 100C) by PECVD or ICP-CVD that have good optical qualities (for waveguide
 applications).</span></p>
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<li class="x_MsoNormal" style="color:black; list-style-type:"1) "">Which deposition system are you using?</li></ol>
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<li class="x_MsoNormal" style="color:black; list-style-type:"2) "">What was the substrate temperature?</li></ol>
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<p class="x_MsoNormal"><span style="color:black">Thank you.</span></p>
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<p><b><span style="font-size:14.0pt; font-family:"Calibri",sans-serif; color:#242424">Philippe Mérel
<i>PhD</i></span></b></p>
<p style="background:white"><span style="font-family:"Calibri",sans-serif; color:#242424">Coordonnateur Laboratoire Nanotechnologies et Nanosystèmes (LNN)</span></p>
<p style="background:white"><span style="font-family:"Calibri",sans-serif; color:#242424">Institut Interdisciplinaire d’Innovation Technologique – 3iT</span></p>
<p style="background:white"><b><span style="font-family:"Calibri",sans-serif; color:#242424">Université de Sherbrooke</span></b></p>
<p style="background:white"><span style="font-size:11.0pt; font-family:"Calibri",sans-serif; color:#242424">(819) 821-8000 x63706</span></p>
<p style="background:white"><span style="font-size:11.0pt; font-family:"Calibri",sans-serif; color:#242424"><br>
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