<html><head><meta http-equiv="content-type" content="text/html; charset=utf-8"></head><body dir="auto">Hello,<div>The surface roughness of the deposited Polysilicon film, it is determined by the intrinsic process conditions. It can not be be improved by high temperature treatments, on contrary, the amorphous film’s crystals size increases during high (> 670C I think) temperature anneal. </div><div>Thanks, Andrei<br id="lineBreakAtBeginningOfSignature"><div dir="ltr">Sent from my iPad</div><div dir="ltr"><br><blockquote type="cite">On Jan 23, 2025, at 3:56 PM, Howard Northfield <Howard.Northfield@uottawa.ca> wrote:<br><br></blockquote></div><blockquote type="cite"><div dir="ltr">
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Dear Labnetwork</div>
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Currently doing PVD deposition of undoped Silicon. Would like to improve the surface roughness and crystal quality of the PVD Silicon using rapid thermal annealing (RTA). Does anyone have experience in this and what RTA recipe you use.</div>
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Thank you</div>
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Howard Northfield</div>
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Research Engineer</div>
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Advanced Research Complex (ARC)</div>
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University of Ottawa</div>
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