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Hello Labnetwork,</div>
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I'm wondering if there's a chemical reason for having dedicated spinners to keep photoresist and ebeam resist separated. I think quite a few of the university nanofabs do this, but wondering what the rationale is. Is there some sort of chemical reaction that
makes it more likely to contaminate or harder to clean up?</div>
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Thanks,</div>
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Grant</div>
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Grant Shao</div>
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Nanofabrication Operations Manager</div>
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<u><a href="http://snsf.stanford.edu/" id="OWAbe3bf7c7-177a-8869-44db-0d194e008f2c" class="OWAAutoLink" data-auth="NotApplicable" data-linkindex="2" data-ogsc="rgb(150, 96, 125)" style="color: rgb(51, 51, 51); margin: 0px;">Stanford Nano Shared Facilities</a></u></div>
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<u><a href="mailto:shaog@stanford.edu" id="OWAed88ed9e-8695-e01f-4c0b-a00095310e7b" class="OWAAutoLink" data-linkindex="3" data-ogsc="rgb(150, 96, 125)" style="color: rgb(51, 51, 51); margin: 0px;">shaog@stanford.edu</a></u> | 650.441.9042</div>
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Spilker Building, Room 004</div>
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348 Via Pueblo</div>
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Stanford, CA 94305-4088</div>
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