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<p class="MsoNormal"><span style="font-size:11.0pt;mso-fareast-language:EN-US">We find that LOR10 is the worst culprit for clogging and will precipitate with acetone. DMSO cleans it well, but then your users ideally need barrier glove PPE to prevent anything
dissolved in it crossing their skin barrier. I don’t see normal nitrile cleanroom gloves as effective protection. We run a extra training session for LOR10 users to clean with DMSO.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;mso-fareast-language:EN-US">We also separate EBL and optical resist spinning. Most of our optical resists are acetone/IPA compatible. We have no problem cleaning S1813, AX20x0, and AZ10XT from the same spin
bowl with them. Some spinner drain designs are more prone to clogging than others if provoked.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;mso-fareast-language:EN-US">BR, Owain<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Dan P. Woodie<br>
<b>Sent:</b> 19 February 2025 17:22<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> Re: [labnetwork] Photoresist and Ebeam Resist In Same Spinner?<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal" style="line-height:16.5pt;background:#F7F9FA"><strong><span lang="EN-US" style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:#8D3970">CAUTION:</span></strong><span lang="EN-US" style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:#8D3970">
This e-mail originated outside the University of Southampton. <o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt">The other consideration is your bowl cleaning protocols after each spin. Some resists will precipitate when mixed with common cleaning solvents like acetone or PGMEA / ethyl lactate, which can
make cleaning harder or if your bowl has a drain, can lead to a clogged line. So even typical “photoresist-like” materials such as PGMI based LOR, which is in a different solvent than most photoresists, can be an issue to mix. At Cornell we developed solvent
“classes” based on this sensitivity to precipitate and grouped spinners to avoid clogged drain lines. A lot of grad students will assume acetone will dissolve everything…<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt">Now if you don’t rinse your bowls with solvent to clean the spun off resist down a drain, that mixing may not be an issue.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;mso-ligatures:standardcontextual">Dan<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;mso-ligatures:standardcontextual"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;mso-ligatures:standardcontextual">Daniel Woodie<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;mso-ligatures:standardcontextual">Director, Micro/Nano Fabrication Center, Princeton Materials Institute<o:p></o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork <<a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a>>
<b>On Behalf Of </b>Golan Tanami<br>
<b>Sent:</b> Wednesday, February 19, 2025 9:25 AM<br>
<b>To:</b> Grant Shao <<a href="mailto:shaog@stanford.edu">shaog@stanford.edu</a>>;
<a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<b>Cc:</b> Galina Chechelnitsky <<a href="mailto:galinac@savion.huji.ac.il">galinac@savion.huji.ac.il</a>>;
<a href="mailto:yuval.yanushpolsk@mail.huji.ac.il">yuval.yanushpolsk@mail.huji.ac.il</a>;
<a href="mailto:itzhak.shweky@mail.huji.ac.il">itzhak.shweky@mail.huji.ac.il</a><br>
<b>Subject:</b> Re: [labnetwork] Photoresist and Ebeam Resist In Same Spinner?<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0">Hi Grant,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0">After consulting with my team cc’d here, there may be two possible reasons that perhaps facilitate this separation:<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<ol style="margin-top:0cm" start="1" type="1">
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<span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif">Avoiding potential contamination, ease of cleanup etc.<o:p></o:p></span></li><li class="MsoListParagraph" style="color:#0070C0;margin-left:0cm;mso-list:l1 level1 lfo3">
<span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif">E-Beam resist is not sensitive to light, thus you’d prefer working under natural lighting conditions (i.e., white light), whereas photoresist (PR) is sensitive to white light (incl.
UV) and this is why yellow lightning is a must. To avoid situations where one may bring PR coated wafer into E-beam spinner that works at the environment of white light, physical separation between the two is necessary.<o:p></o:p></span></li></ol>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0">Best,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0">Golan.
<o:p></o:p></span></p>
<p class="MsoListParagraph"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif;color:#1F497D"><img border="0" width="81" height="90" style="width:.8437in;height:.9375in" id="Picture_x0020_3" src="cid:image001.jpg@01DB8317.A4F7C7B0"></span><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-ligatures:standardcontextual"><o:p></o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-ligatures:standardcontextual">Golan A. Tanami, PhD</span></b><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-ligatures:standardcontextual">
<b>| </b>Head of the Unit for Nanofabrication (UNF)<o:p></o:p></span></p>
<p class="MsoNormal"><b><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black;mso-ligatures:standardcontextual"><o:p> </o:p></span></b></p>
<p class="MsoNormal"><b><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-ligatures:standardcontextual">Center for Nanoscience and Nanotechnology<o:p></o:p></span></b></p>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-ligatures:standardcontextual">Edmond J. Safra Campus</span><span lang="HE" dir="RTL" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-ligatures:standardcontextual"><br>
</span><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-ligatures:standardcontextual">The Hebrew University of Jerusalem</span><span lang="HE" dir="RTL" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-ligatures:standardcontextual"><br>
</span><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black;mso-ligatures:standardcontextual">T +972.2.6584179 | M +972.50.9891111</span><span lang="HE" dir="RTL" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:#0070C0;mso-ligatures:standardcontextual"><br>
</span><span lang="AR-SA" dir="RTL"><a href="mailto:golant@savion.huji.ac.il"><span lang="EN-US" dir="LTR" style="font-family:"Calibri",sans-serif;mso-ligatures:standardcontextual">golant</span><span lang="EN-US" dir="LTR" style="font-size:10.0pt;font-family:"Arial",sans-serif;mso-ligatures:standardcontextual">@savion.huji.ac.il</span></a></span><span style="font-family:"Arial",sans-serif;color:#1F497D;mso-ligatures:standardcontextual"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-ligatures:standardcontextual">Website:
</span><a href="https://nano.huji.ac.il/UNF"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;mso-ligatures:standardcontextual">https://nano.huji.ac.il/UNF</span></a><span lang="AR-SA" dir="RTL" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-ligatures:standardcontextual"><o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="AR-SA" dir="RTL" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0;mso-ligatures:standardcontextual"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Arial",sans-serif;color:#0070C0"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork <<a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a>>
<b>On Behalf Of </b>Grant Shao<br>
<b>Sent:</b> Wednesday, February 19, 2025 4:27 AM<br>
<b>To:</b> <a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<b>Subject:</b> [labnetwork] Photoresist and Ebeam Resist In Same Spinner?<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:black">Hello Labnetwork,<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:black">I'm wondering if there's a chemical reason for having dedicated spinners to keep photoresist and ebeam resist separated. I think quite a few of the university nanofabs
do this, but wondering what the rationale is. Is there some sort of chemical reaction that makes it more likely to contaminate or harder to clean up?<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:black">Thanks,<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:black">Grant<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:#333333">--<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:#333333">Grant Shao<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:#333333">Nanofabrication Operations Manager<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><a href="http://snsf.stanford.edu/"><span style="font-family:"Calibri",sans-serif;color:#333333">Stanford Nano Shared Facilities</span></a></span><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:#333333"><o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:#333333"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><a href="mailto:shaog@stanford.edu"><span style="font-family:"Calibri",sans-serif;color:#333333">shaog@stanford.edu</span></a></span><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:#333333"> | 650.441.9042<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:#333333">Spilker Building, Room 004<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:#333333">348 Via Pueblo<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-family:"Calibri",sans-serif;color:#333333">Stanford, CA 94305-4088<o:p></o:p></span></p>
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