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<div dir="auto">I would expect something along the lines of stuff precipitation in the drain. Common novolak resists use pgema or lactate solvent, usually supplemented with acetone and ipa are cross compatible, and may dry but not precipitate. </div>
<div dir="auto">SU8 is developed - aka soluble - in pgema, but not soluble in acetone as far as I remember. </div>
<div dir="auto">With ebeam resists and-or spin-on glass chemistry is very different and more diverse. Small quantities and wiping the bowl may help with drainage maybe?</div>
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<div dir="auto">Thanks</div>
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<div dir="auto">Mike</div>
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<div id="divRplyFwdMsg" dir="ltr"><font face="Calibri, sans-serif" style="font-size:11pt" color="#000000"><b>From:</b> labnetwork <labnetwork-bounces@mtl.mit.edu> on behalf of Virgínia Soares <vsoares@inesc-mn.pt><br>
<b>Sent:</b> Wednesday, February 19, 2025 8:24:55 AM<br>
<b>To:</b> 'Grant Shao' <shaog@stanford.edu>; labnetwork@mtl.mit.edu <labnetwork@mtl.mit.edu><br>
<b>Subject:</b> Re: [labnetwork] Photoresist and Ebeam Resist In Same Spinner?</font>
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<p class="x_MsoNormal"><span lang="EN-US" style="">Dear Grant,</span></p>
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<p class="x_MsoNormal"><span lang="EN-US" style="">I our lab we use the same spinner for photo and e beam resist, though I am not sure it should be done as we were buying a new resist track and the supplier told us we should not mix negative resists (like most
of our e-beam resists) with positive resists. Something about it being hard to clean as you cannot use the same solvents and that it would end up clogging the lines. That wasn’t for a manual spinner mind you.</span></p>
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<p class="x_MsoNormal"><span lang="EN-US">Virginia Soares</span></p>
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<p class="x_MsoNormal"><b><span lang="EN-US">From:</span></b><span lang="EN-US"> labnetwork <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Grant Shao<br>
<b>Sent:</b> 19 de fevereiro de 2025 02:27<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] Photoresist and Ebeam Resist In Same Spinner?</span></p>
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<p class="x_MsoNormal"><span lang="EN-US" style="font-size:12.0pt; color:black">Hello Labnetwork,</span></p>
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<p class="x_MsoNormal"><span lang="EN-US" style="font-size:12.0pt; color:black">I'm wondering if there's a chemical reason for having dedicated spinners to keep photoresist and ebeam resist separated. I think quite a few of the university nanofabs do this,
but wondering what the rationale is. Is there some sort of chemical reaction that makes it more likely to contaminate or harder to clean up?</span></p>
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<p class="x_MsoNormal"><span lang="EN-US" style="font-size:12.0pt; color:black">Thanks,</span></p>
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<p class="x_MsoNormal"><span lang="EN-US" style="font-size:12.0pt; color:black">Grant</span></p>
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