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Hi Grant,<br>
<br>
Here at UDel, we have two sets of spinners/hotplates for e-beam
resists, two sets for photo-resists, and one set for gooey
materials, such as SU-8.<br>
<br>
As you know, e-beam resists typically require higher baking
temperatures so the hotplates for the e-beam units are set at higher
temperatures. We train the users to use the appropriate
spinner/hotplate for their type of resist so they do not have to
adjust the hot plate temperatures (cool downs are very slow).
However, if something goes wrong with the photo-resist units, we
allow photo-resists in the e-beam units; e-beam resists are allowed
in the photo-resists units if the e-beam units are down.<br>
<br>
We are very strict with the gooey materials; they can only be used
in their designated unit and stuff that is processed in the e-beam
or photo units is not allowed in the gooey unit. This is mostly
dictated by cleaning considerations.<br>
<br>
Cheers,<br>
<br>
Iulian<br>
<br>
<pre class="moz-signature" cols="72">iulian Codreanu, Ph.D.
Director, Nanofabrication Facility
University of Delaware
Harker ISE Lab, Room 163
221 Academy Street
Newark, DE 19716
302-831-2784
<a class="moz-txt-link-freetext" href="https://udnf.udel.edu">https://udnf.udel.edu</a></pre>
<div class="moz-cite-prefix">On 2/18/2025 9:27 PM, Grant Shao wrote:<br>
</div>
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Hello Labnetwork,</div>
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<br>
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I'm wondering if there's a chemical reason for having dedicated
spinners to keep photoresist and ebeam resist separated. I think
quite a few of the university nanofabs do this, but wondering
what the rationale is. Is there some sort of chemical reaction
that makes it more likely to contaminate or harder to clean up?</div>
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<br>
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Thanks,</div>
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Grant</div>
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<br>
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--</div>
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Grant Shao</div>
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Nanofabrication Operations Manager</div>
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<br>
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