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</o:shapelayout></xml><![endif]--></head><body lang=PT link=blue vlink=purple><div class=WordSection1><p class=MsoNormal><span lang=EN-US style='mso-fareast-language:EN-US'>Dear Grant,<o:p></o:p></span></p><p class=MsoNormal><span lang=EN-US style='mso-fareast-language:EN-US'><o:p> </o:p></span></p><p class=MsoNormal><span lang=EN-US style='mso-fareast-language:EN-US'>I our lab we use the same spinner for photo and e beam resist, though I am not sure it should be done as we were buying a new resist track and the supplier told us we should not mix negative resists (like most of our e-beam resists) with positive resists. Something about it being hard to clean as you cannot use the same solvents and that it would end up clogging the lines. That wasn’t for a manual spinner mind you.<o:p></o:p></span></p><p class=MsoNormal><span lang=EN-US style='mso-fareast-language:EN-US'><o:p> </o:p></span></p><div><p class=MsoNormal><span lang=EN-US>Melhores Cumprimentos/Best Regards<o:p></o:p></span></p><p class=MsoNormal><span lang=EN-US><o:p> </o:p></span></p><p class=MsoNormal><span lang=EN-US><o:p> </o:p></span></p><p class=MsoNormal><span lang=EN-US>Virginia Soares<o:p></o:p></span></p><p class=MsoNormal><img width=163 height=62 style='width:1.7in;height:.6416in' id="Picture_x0020_1" src="cid:image001.png@01DB82D1.0B2017F0" alt="cid:image001.png@01DB82D1.0B2017F0"><o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>INESC-MN<o:p></o:p></p><p class=MsoNormal>Rua Alves Redol,9<o:p></o:p></p><p class=MsoNormal>1000-029 Lisboa<o:p></o:p></p><p class=MsoNormal>Portugal<o:p></o:p></p><p class=MsoNormal>www.inesc-mn.pt<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p></div><p class=MsoNormal><span style='mso-fareast-language:EN-US'><o:p> </o:p></span></p><div><div style='border:none;border-top:solid #E1E1E1 1.0pt;padding:3.0pt 0cm 0cm 0cm'><p class=MsoNormal><b><span lang=EN-US>From:</span></b><span lang=EN-US> labnetwork <labnetwork-bounces@mtl.mit.edu> <b>On Behalf Of </b>Grant Shao<br><b>Sent:</b> 19 de fevereiro de 2025 02:27<br><b>To:</b> labnetwork@mtl.mit.edu<br><b>Subject:</b> [labnetwork] Photoresist and Ebeam Resist In Same Spinner?<o:p></o:p></span></p></div></div><p class=MsoNormal><span lang=EN-US><o:p> </o:p></span></p><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:black'>Hello Labnetwork,<o:p></o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:black'><o:p> </o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:black'>I'm wondering if there's a chemical reason for having dedicated spinners to keep photoresist and ebeam resist separated. I think quite a few of the university nanofabs do this, but wondering what the rationale is. Is there some sort of chemical reaction that makes it more likely to contaminate or harder to clean up?<o:p></o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:black'><o:p> </o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:black'>Thanks,<o:p></o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:black'>Grant<o:p></o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:black'><o:p> </o:p></span></p></div><div id=Signature><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:#333333'>--<o:p></o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:#333333'>Grant Shao<o:p></o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:#333333'>Nanofabrication Operations Manager<o:p></o:p></span></p></div><div><p class=MsoNormal><a href="http://snsf.stanford.edu/"><span lang=EN-US style='font-size:12.0pt;color:#333333'>Stanford Nano Shared Facilities</span></a><span lang=EN-US style='font-size:12.0pt;color:#333333'><o:p></o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:#333333'><o:p> </o:p></span></p></div><div><p class=MsoNormal><a href="mailto:shaog@stanford.edu"><span lang=EN-US style='font-size:12.0pt;color:#333333'>shaog@stanford.edu</span></a><span lang=EN-US style='font-size:12.0pt;color:#333333'> | 650.441.9042<o:p></o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:#333333'>Spilker Building, Room 004<o:p></o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:#333333'>348 Via Pueblo<o:p></o:p></span></p></div><div><p class=MsoNormal><span lang=EN-US style='font-size:12.0pt;color:#333333'>Stanford, CA 94305-4088<o:p></o:p></span></p></div></div></div></body></html>