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</o:shapelayout></xml><![endif]--></head><body lang=EN-US link=blue vlink=purple style='word-wrap:break-word'><div class=WordSection1><p class=MsoNormal><span style='font-size:11.0pt'>Grant,<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'><o:p> </o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'>The primary reason we do it is that they use different solvents. Unless all solvent has evaporated before spinning a different material it can affect the resulting film. There are also some incompatible solids; for example, PMMA doesn’t dissolve in PGMEA, so bowl drains can become clogged. The worst cases are things like LOR or SU-8, which seem to react in the resist bowl and drain, causing clogs that can be extremely difficult to remove.<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'><o:p> </o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'><o:p> </o:p></span></p><div><p class=MsoNormal><span style='font-size:11.0pt'>Garry J. Bordonaro<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'>Microlithographic Engineer<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'>Cornell NanoScale Facility<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'>250 Duffield Hall<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'>343 Campus Road<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'>Ithaca NY 14853-2700<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'>(607) 254-4936<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'><a href="mailto:bordonaro@cnf.cornell.edu">bordonaro@cnf.cornell.edu</a><o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'><a href="https://urldefense.com/v3/__http:/www.cnf.cornell.edu/__;!!CGUSO5OYRnA7CQ!ZY8vaa6Dic60FCmOQAxjnkXsgTU0wdr0_isxKXz62yL173_qmqqTpBoe2XDaz99epFiEtkfKtcNsm0xsvUKcZ_yMamumB5QqCQ$">http://www.cnf.cornell.edu/</a><o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'><o:p> </o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'>Please acknowledge CNF in your publications:<o:p></o:p></span></p><p class=MsoNormal><span style='font-size:11.0pt'>"This work was performed in part at the Cornell NanoScale Science & Technology Facility (CNF), a member of the National Nanotechnology Coordinated Infrastructure (NNCI), which is supported by the National Science Foundation (Grant NNCI-2025233)."<span style='mso-ligatures:standardcontextual'><o:p></o:p></span></span></p></div><p class=MsoNormal><span style='font-size:11.0pt'><o:p> </o:p></span></p><div><div style='border:none;border-top:solid #E1E1E1 1.0pt;padding:3.0pt 0in 0in 0in'><p class=MsoNormal><b><span style='font-size:11.0pt;font-family:"Calibri",sans-serif'>From:</span></b><span style='font-size:11.0pt;font-family:"Calibri",sans-serif'> labnetwork <labnetwork-bounces@mtl.mit.edu> <b>On Behalf Of </b>Grant Shao<br><b>Sent:</b> Tuesday, February 18, 2025 9:27 PM<br><b>To:</b> labnetwork@mtl.mit.edu<br><b>Subject:</b> [labnetwork] Photoresist and Ebeam Resist In Same Spinner?<o:p></o:p></span></p></div></div><p class=MsoNormal><o:p> </o:p></p><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:black'>Hello Labnetwork,<o:p></o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:black'><o:p> </o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:black'>I'm wondering if there's a chemical reason for having dedicated spinners to keep photoresist and ebeam resist separated. I think quite a few of the university nanofabs do this, but wondering what the rationale is. Is there some sort of chemical reaction that makes it more likely to contaminate or harder to clean up?<o:p></o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:black'><o:p> </o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:black'>Thanks,<o:p></o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:black'>Grant<o:p></o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:black'><o:p> </o:p></span></p></div><div id=Signature><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:#333333'>--<o:p></o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:#333333'>Grant Shao<o:p></o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:#333333'>Nanofabrication Operations Manager<o:p></o:p></span></p></div><div><p class=MsoNormal><u><span style='font-family:"Calibri",sans-serif;color:#333333'><a href="http://snsf.stanford.edu/"><span style='color:#333333'>Stanford Nano Shared Facilities</span></a></span></u><span style='font-family:"Calibri",sans-serif;color:#333333'><o:p></o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:#333333'><o:p> </o:p></span></p></div><div><p class=MsoNormal><u><span style='font-family:"Calibri",sans-serif;color:#333333'><a href="mailto:shaog@stanford.edu"><span style='color:#333333'>shaog@stanford.edu</span></a></span></u><span style='font-family:"Calibri",sans-serif;color:#333333'> | 650.441.9042<o:p></o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:#333333'>Spilker Building, Room 004<o:p></o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:#333333'>348 Via Pueblo<o:p></o:p></span></p></div><div><p class=MsoNormal><span style='font-family:"Calibri",sans-serif;color:#333333'>Stanford, CA 94305-4088<o:p></o:p></span></p></div></div></div></body></html>