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<p class="MsoNormal"><span style="font-size:11.0pt">Hi Nathan,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">Reduced code considerations can be significant benefit.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">If you can get <1.37% SiH4 the gas is not governed by CGA G-13.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">If you can get below the flammability mixture ranges in CGA P-23 you are not flammable.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">Assuming you had good results with 2%, you might find a better use for the process gas hardware and associated volume (i.e. MAQ) with an additional hazardous gas.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">I can’t speak to the process benefits or research results.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">Best,<o:p></o:p></span></p>
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<p class="MsoNormal" style="background:white"><b><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black">Nicholas Menounos, </span></b><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black">PE, LEED AP</span><span style="font-size:11.0pt;font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black">Associate Director of Infrastructure</span><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><b><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#212121"> </span></b><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><b><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#212121">MIT.nano</span></b><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><b><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black">Massachusetts Institute of Technology</span></b><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black">77 Massachusetts Ave, Bldg 12-5007</span><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black">Cambridge, MA 02139</span><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black">Cell: </span><span style="color:black;mso-ligatures:standardcontextual"><a href="tel:+15089320938"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;mso-ligatures:none">(508)
932-0938</span></a></span><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal" style="background:white"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black">Office: </span><span style="color:black;mso-ligatures:standardcontextual"><a href="tel:+16172537234"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;mso-ligatures:none">(617)
253-7234</span></a></span><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black">Email: </span><span style="mso-ligatures:standardcontextual"><a href="mailto:Menounos@mit.edu"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;mso-ligatures:none">Menounos@mit.edu</span></a><o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Martin, Michael<br>
<b>Sent:</b> Tuesday, April 8, 2025 12:52 PM<br>
<b>To:</b> Nathan Aultman <naultman@creol.ucf.edu>; labnetwork@mtl.mit.edu<br>
<b>Subject:</b> Re: [labnetwork] PECVD dilute gas question(s)<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="color:black">Hi Nathan,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="color:black"> We are using 5% SiH4 in Argon. We switched to this from 100% SiH4 some years ago after we had a fire while swapping out a tank. Our stress and other data for nitrides can be found here
<a href="https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf">
https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf</a><o:p></o:p></span></p>
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<p class="MsoNormal"><span style="color:black">In essence, it works for us. <o:p></o:p></span></p>
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<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="color:black">-Michael<o:p></o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:black">From:</span></b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:black"> labnetwork <<a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a>>
on behalf of Nathan Aultman <<a href="mailto:naultman@creol.ucf.edu">naultman@creol.ucf.edu</a>><br>
<b>Sent:</b> Monday, April 7, 2025 9:49 AM<br>
<b>To:</b> <a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a> <<a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a>><br>
<b>Subject:</b> [labnetwork] PECVD dilute gas question(s)</span> <o:p></o:p></p>
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<p class="MsoNormal"> <o:p></o:p></p>
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<p class="xmsonormal" style="line-height:12.0pt;background:#FF4D4D"><b><span style="font-size:10.0pt;color:black">CAUTION:</span></b><span style="font-size:10.0pt;color:black"> This email originated from outside of our organization. Do not click links, open
attachments, or respond unless you recognize the sender's email address and know the contents are safe.</span><o:p></o:p></p>
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<p class="xmsonormal"><span style="font-size:11.0pt">Hello Labnetwork,</span><o:p></o:p></p>
<p class="xmsonormal"><span style="font-size:11.0pt"> </span><o:p></o:p></p>
<p class="xmsonormal"><span style="font-size:11.0pt">We have a PECVD system using dilute silane (2%)/N2. Some labs with similar systems use dilute silane (5%)/helium. We are nearing the end of our current cylinder and will need a replacement soon. What are
the advantages and disadvantages when choosing the dilute gas? Does choosing a helium mixture produce more desirable films and/or quality? In other words, is it worth it to purchase a cylinder with helium? Also, what would be the reason(s) for using helium
as an additional process gas? E.g., a separate MFC and gas line.</span><o:p></o:p></p>
<p class="xmsonormal"><span style="font-size:11.0pt"> </span><o:p></o:p></p>
<p class="xmsonormal"><span style="font-size:11.0pt">Thank you all in advance.</span><o:p></o:p></p>
<p class="xmsonormal"><span style="font-size:11.0pt"> </span><o:p></o:p></p>
<p class="xmsonormal"><span style="font-size:11.0pt;font-family:"Times New Roman",serif">Nathan C. Aultman</span><o:p></o:p></p>
<p class="xmsonormal"><span style="font-size:11.0pt;font-family:"Times New Roman",serif">University of Central Florida</span><o:p></o:p></p>
<p class="xmsonormal"><span style="font-size:11.0pt;font-family:"Times New Roman",serif">407-823-6852</span><o:p></o:p></p>
<p class="xmsonormal"><span style="font-size:11.0pt;font-family:"Times New Roman",serif"><a href="mailto:naultman@creol.ucf.edu"><span style="color:#0563C1">naultman@creol.ucf.edu</span></a></span><o:p></o:p></p>
<p class="xmsonormal"> <o:p></o:p></p>
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