<div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr">If anybody happens to be doing PECVD with <span style="font-size:14.6667px"><1.37% SiH4, then please let me know.</span></div><div><span style="font-size:14.6667px">I've previously approached vendors about PECVD tools and processes for </span><span style="font-size:14.6667px"><1.37% SiH4, and there didn't seem to be much interest.</span></div><div><span style="font-size:14.6667px">I don't think I'm aware of anybody using </span><span style="font-size:14.6667px"><2% SiH4.</span></div><div><span style="font-size:14.6667px"><br></span></div><div><span style="font-size:14.6667px"> Nathan - I'm interested in the responses you receive for my own education. There are a lot of research papers, but I don't know that I've seen a single overall summary on the implications of the different dilutant gases for all of silicon oxide, silicon nitride, and silicon films (although it's not clear to me if you intend to try any silicon deposition) but the dilutant gas does impact film properties and can also influence other things such as plasma stability and deposition rates. I've recently asked a couple of tool vendors this question with a goal of wanting to have the ability to deposit PECVD SiOx, SiNx, and amorphous poly and they seemed to lean more towards suggesting silane diluted with argon.</span></div><div><span style="font-size:14.6667px"><br></span></div><div><span style="font-size:14.6667px">Phil Chapman - Dartmouth College</span></div><div><span style="font-size:14.6667px"><a href="mailto:phillip.f.chapman@dartmouth.edu">phillip.f.chapman@dartmouth.edu</a></span></div><div><span style="font-size:14.6667px">or</span></div><div><span style="font-size:14.6667px"><a href="mailto:phillip.chapman83@gmail.com">phillip.chapman83@gmail.com</a></span></div><div><span style="font-size:14.6667px"><br></span></div></div></div></div><br><div class="gmail_quote gmail_quote_container"><div dir="ltr" class="gmail_attr">On Thu, Apr 10, 2025 at 7:50 AM Nicholas Menounos <<a href="mailto:menounos@mit.edu">menounos@mit.edu</a>> wrote:<br></div><blockquote class="gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex"><div class="msg8172842240340005532">
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<p class="MsoNormal"><span style="font-size:11pt">Hi Nathan,<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt"><u></u> <u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt">Reduced code considerations can be significant benefit.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt"><u></u> <u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt">If you can get <1.37% SiH4 the gas is not governed by CGA G-13.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt">If you can get below the flammability mixture ranges in CGA P-23 you are not flammable.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt"><u></u> <u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt">Assuming you had good results with 2%, you might find a better use for the process gas hardware and associated volume (i.e. MAQ) with an additional hazardous gas.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt"><u></u> <u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt">I can’t speak to the process benefits or research results.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt"><u></u> <u></u></span></p>
<p class="MsoNormal"><span style="font-size:11pt">Best,<u></u><u></u></span></p>
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<p class="MsoNormal" style="background:white"><b><span style="font-size:10pt;font-family:Arial,sans-serif;color:black">Nicholas Menounos, </span></b><span style="font-size:10pt;font-family:Arial,sans-serif;color:black">PE, LEED AP</span><span style="font-size:11pt;font-family:Calibri,sans-serif"><u></u><u></u></span></p>
<p class="MsoNormal" style="background:white"><span style="font-size:9pt;font-family:Arial,sans-serif;color:black">Associate Director of Infrastructure</span><span style="font-family:Calibri,sans-serif"><u></u><u></u></span></p>
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<p class="MsoNormal" style="background:white"><b><span style="font-size:9pt;font-family:Arial,sans-serif;color:rgb(33,33,33)">MIT.nano</span></b><span style="font-family:Calibri,sans-serif"><u></u><u></u></span></p>
<p class="MsoNormal" style="background:white"><b><span style="font-size:9pt;font-family:Arial,sans-serif;color:black">Massachusetts Institute of Technology</span></b><span style="font-family:Calibri,sans-serif"><u></u><u></u></span></p>
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<p class="MsoNormal"><span style="font-size:11pt"><u></u> <u></u></span></p>
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<p class="MsoNormal"><b><span style="font-size:11pt;font-family:Calibri,sans-serif">From:</span></b><span style="font-size:11pt;font-family:Calibri,sans-serif"> labnetwork <<a href="mailto:labnetwork-bounces@mtl.mit.edu" target="_blank">labnetwork-bounces@mtl.mit.edu</a>>
<b>On Behalf Of </b>Martin, Michael<br>
<b>Sent:</b> Tuesday, April 8, 2025 12:52 PM<br>
<b>To:</b> Nathan Aultman <<a href="mailto:naultman@creol.ucf.edu" target="_blank">naultman@creol.ucf.edu</a>>; <a href="mailto:labnetwork@mtl.mit.edu" target="_blank">labnetwork@mtl.mit.edu</a><br>
<b>Subject:</b> Re: [labnetwork] PECVD dilute gas question(s)<u></u><u></u></span></p>
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<p class="MsoNormal"><u></u> <u></u></p>
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<p class="MsoNormal"><span style="color:black">Hi Nathan,<u></u><u></u></span></p>
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<p class="MsoNormal"><span style="color:black"> We are using 5% SiH4 in Argon. We switched to this from 100% SiH4 some years ago after we had a fire while swapping out a tank. Our stress and other data for nitrides can be found here
<a href="https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf" target="_blank">
https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf</a><u></u><u></u></span></p>
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<p class="MsoNormal"><span style="color:black">In essence, it works for us. <u></u><u></u></span></p>
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<p class="MsoNormal"><span style="color:black"><u></u> <u></u></span></p>
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<p class="MsoNormal"><span style="color:black">-Michael<u></u><u></u></span></p>
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<p class="MsoNormal"><b><span style="font-size:11pt;font-family:Calibri,sans-serif;color:black">From:</span></b><span style="font-size:11pt;font-family:Calibri,sans-serif;color:black"> labnetwork <<a href="mailto:labnetwork-bounces@mtl.mit.edu" target="_blank">labnetwork-bounces@mtl.mit.edu</a>>
on behalf of Nathan Aultman <<a href="mailto:naultman@creol.ucf.edu" target="_blank">naultman@creol.ucf.edu</a>><br>
<b>Sent:</b> Monday, April 7, 2025 9:49 AM<br>
<b>To:</b> <a href="mailto:labnetwork@mtl.mit.edu" target="_blank">labnetwork@mtl.mit.edu</a> <<a href="mailto:labnetwork@mtl.mit.edu" target="_blank">labnetwork@mtl.mit.edu</a>><br>
<b>Subject:</b> [labnetwork] PECVD dilute gas question(s)</span> <u></u><u></u></p>
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<p class="MsoNormal"> <u></u><u></u></p>
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<p class="m_8172842240340005532xmsonormal" style="line-height:12pt;background:rgb(255,77,77)"><b><span style="font-size:10pt;color:black">CAUTION:</span></b><span style="font-size:10pt;color:black"> This email originated from outside of our organization. Do not click links, open
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<p class="m_8172842240340005532xmsonormal"><span style="font-size:11pt">Hello Labnetwork,</span><u></u><u></u></p>
<p class="m_8172842240340005532xmsonormal"><span style="font-size:11pt"> </span><u></u><u></u></p>
<p class="m_8172842240340005532xmsonormal"><span style="font-size:11pt">We have a PECVD system using dilute silane (2%)/N2. Some labs with similar systems use dilute silane (5%)/helium. We are nearing the end of our current cylinder and will need a replacement soon. What are
the advantages and disadvantages when choosing the dilute gas? Does choosing a helium mixture produce more desirable films and/or quality? In other words, is it worth it to purchase a cylinder with helium? Also, what would be the reason(s) for using helium
as an additional process gas? E.g., a separate MFC and gas line.</span><u></u><u></u></p>
<p class="m_8172842240340005532xmsonormal"><span style="font-size:11pt"> </span><u></u><u></u></p>
<p class="m_8172842240340005532xmsonormal"><span style="font-size:11pt">Thank you all in advance.</span><u></u><u></u></p>
<p class="m_8172842240340005532xmsonormal"><span style="font-size:11pt"> </span><u></u><u></u></p>
<p class="m_8172842240340005532xmsonormal"><span style="font-size:11pt;font-family:"Times New Roman",serif">Nathan C. Aultman</span><u></u><u></u></p>
<p class="m_8172842240340005532xmsonormal"><span style="font-size:11pt;font-family:"Times New Roman",serif">University of Central Florida</span><u></u><u></u></p>
<p class="m_8172842240340005532xmsonormal"><span style="font-size:11pt;font-family:"Times New Roman",serif">407-823-6852</span><u></u><u></u></p>
<p class="m_8172842240340005532xmsonormal"><span style="font-size:11pt;font-family:"Times New Roman",serif"><a href="mailto:naultman@creol.ucf.edu" target="_blank"><span style="color:rgb(5,99,193)">naultman@creol.ucf.edu</span></a></span><u></u><u></u></p>
<p class="m_8172842240340005532xmsonormal"> <u></u><u></u></p>
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