<div dir="ltr">Hi Norman,<div><br></div><div>We have a custom system at the UC Berkeley Marvell NanoLab that we developed in house. It can flow Ar, N2, O2, and H2. It's got very aggressive pressure control as well as DC, RF, and HIPIMS sources. The biggest challenge is usually navigating the sheer amount of materials people want to deposit in it.<br><br>It's a *very* popular tool.</div><div><br></div><div>-Ryan<br></div></div><br><div class="gmail_quote gmail_quote_container"><div dir="ltr" class="gmail_attr">On Thu, Apr 17, 2025 at 5:30 AM Norman Gottron <<a href="mailto:ngottron@andrew.cmu.edu">ngottron@andrew.cmu.edu</a>> wrote:<br></div><blockquote class="gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex"><div dir="ltr"><div class="gmail_default" style="font-family:verdana,sans-serif">Hi All,</div><div class="gmail_default" style="font-family:verdana,sans-serif"><br></div><div class="gmail_default" style="font-family:verdana,sans-serif">I was wondering if anyone in the network has a system that is set up to sputter with a background of H2 or NH3. We had a request for this process from a well-resourced company, but as of yet I haven't found anyone who could even have a conversation with them about it. I'd be happy to put you directly in touch with them - I don't seek to be a middleman on this development project!</div><div class="gmail_default" style="font-family:verdana,sans-serif"><br></div><div class="gmail_default" style="font-family:verdana,sans-serif">Best,</div><div class="gmail_default" style="font-family:verdana,sans-serif">Norm Gottron</div></div>
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