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</style></head><body><div>Dear Lab members,</div><div><br></div><div>I am looking at purchasing a used TEL NT 333 ALD system .</div><div>The scope of this is to process wafers in an experimental ALD process at high temperature, between around 700C to 800C.</div><div><br></div><div>Unfortunately, the detailed performance specifications of the TEL NT333 system have not been forthcoming from my potential supplier thus far.</div><div><br></div><div>I was therefore wondering if any Lab Members might be able to send me the detailed performance specifications for the TEL NT 333 ALD platform ?</div><div><br></div><div>Specifically , the questions I need to answer are as following:-</div><div><br></div><div>1. Wafer size compatibility (300 mm)</div><div>2. The kind of ALD it runs (Plasma ALD)</div><div>3. Confirm the tool can potentially deposit high-k oxides (HfO2 and ZrO2) and some nitrides (Hf and Zr based).</div><div>4. Data about the machine throughput capabilities i.e how many wafers it can run per hour.</div><div>5. What is the processing temperature range specification .</div><div>6. Please give detailed specifications about the pre and post-processing steps which can be done between each ALD step.</div><div>7. Please give the process vacuum specifications.</div><div><br></div><div>Thanks for any input.</div><div><br></div><div>Yours sincerely,</div><div><br></div><div>SDI Fabsurplus Italia SRL</div><div>Stephen Howe</div><div>Company Owner</div><div>email:<span class="Apple-converted-space"> </span><a href="mailto:info@fabsurplus.com" title="Click to mail info@fabsurplus.com">info@fabsurplus.com</a></div><div>Mobile: Italy (+39) 335-710-7756 (Also available for WhatsApp Calls)</div><div>Home Office: Italy (+39) 081-240-3115</div><div>WWW.FABSURPLUS.COM</div><div>Your Marketplace for Used Semiconductor Equipment</div><br class="Apple-interchange-newline"><div><span></span></div></body></html>