<div dir="ltr"><div><p class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">Hello everyone,</p>

<p class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif"> </p>

<p class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">The Lurie
Nanofabrication Facility at the University of Michigan is looking to fill a new
position for an equipment engineer. This position will be primarily
responsible for supporting maintenance efforts on a variety of semiconductor
manufacturing equipment including:</p>

<ul style="margin-top:0in;margin-bottom:0in" type="disc">
 <li class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">Vacuum systems</li>
 <li class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">System controls</li>
 <li class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">Electrical systems and circuits</li>
 <li class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">RF power delivery systems</li>
 <li class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">Robot calibrations</li>
</ul>

<p class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">As part of the
equipment support team, your primary duties will focus on:</p>

<ul style="margin-top:0in;margin-bottom:0in" type="disc">
 <li class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">Training of laboratory users to operate equipment</li>
 <li class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">Routine equipment maintenance tasks according to
     maintenance manuals, schematics and blueprints, utilizing metrology
     equipment for equipment process characterization, and manually cleaning
     process chambers and kits</li>
 <li class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">Inventory control for spares</li>
 <li class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">Handling of hazardous chemicals and gases</li>
</ul>

<ul style="margin-top:0in;margin-bottom:0in" type="disc">
 <li class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">Development and documentation of procedures, tool
     performance metrics, and best-known methods</li>
</ul>

<p class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif"> </p>

<p class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">How to apply
and the full job description including responsibilities, required
knowledge, skills and experience can be found here.</p>

<p class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif"><a href="https://careers.umich.edu/job_detail/268325/engineer-research-lnf-operations" style="color:rgb(5,99,193)">https://careers.umich.edu/job_detail/268325/engineer-research-lnf-operations</a></p>

<p class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif"> </p>

<p class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif">Please feel
free to pass this on to anyone who may be interested.<br>
<br>
Thank you,</p><p class="MsoNormal" style="margin:0in;line-height:normal;font-size:12pt;font-family:Calibri,sans-serif"><br></p></div><div><div dir="ltr" class="gmail_signature" data-smartmail="gmail_signature"><div dir="ltr">Tony Sebastian<div>Senior Director- LNF Operations</div><div>Lurie Nanofabrication Facility</div><div>University of Michigan</div><div>1301 Beal Ave</div><div>Room 1247</div><div>Ann Arbor, MI 48109</div></div></div></div></div>