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Hello</div>
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I am somewhat new to SU-8 working with Positive resists throughout my career. I agree with data sheets are just guideline, for processing. I saw a note from another University to run a 65 deg post bake after the 95 deg soft bake. My question is about mask
cleaning. Is Sulfuric/Peroxide (Piranha ~ 60-90C) really needed. I would think the PGMEA or PGMEA/Acetone followed by IPA would be an effective clean. Just wanted to poll the audience. </div>
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<p style="line-height: 1.38; margin: 0in 0in 8pt;"><span style="font-family: Aptos, sans-serif; font-size: 12pt; color: rgb(0, 0, 0);"><b>Thank you,</b></span></p>
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<b>Phillip Bauer </b></div>
<p style="line-height: 1.38; margin: 0in 0in 8pt;"><span style="font-family: Aptos, sans-serif; font-size: 12pt; color: rgb(0, 0, 0);">Principal Photolithography Process Engineer</span></p>
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4350 Innovation Drive</div>
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Farmers Branch, Texas 75244</div>
<p style="line-height: 1.38; margin: 0in 0in 8pt;"><span style="font-family: Aptos, sans-serif; font-size: 12pt; color: rgb(70, 120, 134);"><u><a style="color: rgb(70, 120, 134); margin-top: 0px; margin-bottom: 0px;" href="mailto:phillip.bauer@formfactor.com">phillip.bauer@formfactor.com</a></u></span></p>
<p style="line-height: 1.38; margin: 0in 0in 8pt;"><span style="font-family: Aptos, sans-serif; font-size: 12pt; color: rgb(0, 0, 0);">M: 682 521 0874</span></p>
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