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</o:shapelayout></xml><![endif]--></head><body lang=EN-US link="#0563C1" vlink="#954F72"><div class=WordSection1><p class=MsoNormal>Mario,<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>We require safety glasses, face shield, and nitrile gloves while using photoresist spinners, and at the wet bench for handling and developing. No aprons, and no special protection provided that there is adequate ventilation. For spills, heavier gloves and possibly a respirator would be needed.<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><div><p class=MsoNormal>Garry J. Bordonaro<o:p></o:p></p><p class=MsoNormal>Microlithographic Engineer<o:p></o:p></p><p class=MsoNormal>Cornell NanoScale Facility<o:p></o:p></p><p class=MsoNormal>250 Duffield Hall<o:p></o:p></p><p class=MsoNormal>343 Campus Road<o:p></o:p></p><p class=MsoNormal>Ithaca NY 14853-2700<o:p></o:p></p><p class=MsoNormal>(607) 254-4936<o:p></o:p></p><p class=MsoNormal><a href="mailto:bordonaro@cnf.cornell.edu"><span style='color:blue'>bordonaro@cnf.cornell.edu</span></a><o:p></o:p></p><p class=MsoNormal><a href="http://www.cnf.cornell.edu/"><span style='color:blue'>http://www.cnf.cornell.edu/</span></a><o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Please acknowledge CNF in your publications:<o:p></o:p></p><p class=MsoNormal>"This work was performed in part at the Cornell NanoScale Science & Technology Facility (CNF), a member of the National Nanotechnology Coordinated Infrastructure (NNCI), which is supported by the National Science Foundation (Grant NNCI-2025233)."<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><o:p> </o:p></p></div><p class=MsoNormal><o:p> </o:p></p><div><div style='border:none;border-top:solid #E1E1E1 1.0pt;padding:3.0pt 0in 0in 0in'><p class=MsoNormal><b>From:</b> labnetwork <labnetwork-bounces@mtl.mit.edu> <b>On Behalf Of </b>Beaudoin, Mario<br><b>Sent:</b> Monday, April 20, 2026 6:38 PM<br><b>To:</b> labnetwork@mtl.mit.edu<br><b>Subject:</b> [labnetwork] Cleanroom gowning to handle resists and developers<o:p></o:p></p></div></div><p class=MsoNormal><o:p> </o:p></p><p>Dear Network,<o:p></o:p></p><p>In our cleanrooms, we handle photoresists and developers with common cleanroom apparel (coveralls, hoods, nitrile gloves and eye protection). Do any of you require extra special aprons, full visors and 4H gloves? I've worked in many cleanrooms and never encountered such requirements.<o:p></o:p></p><p>Mario<o:p></o:p></p><div><p class=MsoNormal>-- <br><img border=0 width=340 height=204 style='width:3.5416in;height:2.125in' id="_x0000_i1025" src="cid:image001.jpg@01DCD16F.06576C80"><o:p></o:p></p></div></div></body></html>