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Hello Lab Network,</div>
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Do you deposit LPCVD amorphous silicon onto a borosilicate glass substrate? Do you have concerns about Na or Al from the substrate being transferred at 525C to the furnace walls or boat or paddle to present a cross contamination issue? Due to the boron content,
I don't expect the wafers to slump at that temperature, but I wonder about the Hydrogen (resulting from silane pyrolysis) scavenging Oxygen from the wafer surface to cause the remaining bond energy for a dangling Na or Al to be low enough to be overcome by
thermal energy. Of course, this would be only at the beginning of deposition.</div>
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We have rules to prevent glass from being used as a substrate in our furnaces, but for LPCVD at 525C, and for borosilicate glass, would you make an exception?</div>
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Kathy Anderson</div>
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University of Utah Nanofab</div>
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