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<p class="MsoNormal"><a name="x__MailAutoSig"><span style="font-size:11.0pt">For wet benches (sashless) at MIT.nano we designed around 100 FPM capture velocity from a vertical plane of the face shield with an “unoccupied mode” which ramps down to 80 FPM (all
heaters off, all covers on, lights off, no process running).<o:p></o:p></span></a></p>
<p class="MsoNormal"><span style="mso-bookmark:x__MailAutoSig"><span style="font-size:11.0pt"><o:p> </o:p></span></span></p>
<p class="MsoNormal"><span style="mso-bookmark:x__MailAutoSig"><span style="font-size:11.0pt">The ASHRAE 110 ejector was placed 6” behind that plane. Our specification called for lip exhaust (which we have), but with no performance criteria or as-installed
testing.<o:p></o:p></span></span></p>
<p class="MsoNormal"><span style="mso-bookmark:x__MailAutoSig"><span style="font-size:11.0pt"><o:p> </o:p></span></span></p>
<p class="MsoNormal"><span style="mso-bookmark:x__MailAutoSig"><span style="font-size:11.0pt">Bad sketch below:<o:p></o:p></span></span></p>
<p class="MsoNormal"><span style="mso-bookmark:x__MailAutoSig"><span style="font-size:11.0pt"><o:p> </o:p></span></span></p>
<p class="MsoNormal"><span style="mso-bookmark:x__MailAutoSig"><span style="font-size:11.0pt"><img width="442" height="383" style="width:4.6041in;height:3.9861in" id="Picture_x0020_1" src="cid:image002.png@01DD0DF8.A1B50AF0"></span></span><span style="mso-bookmark:x__MailAutoSig"><span style="font-size:11.0pt"><o:p></o:p></span></span></p>
<p class="MsoNormal"><span style="mso-bookmark:x__MailAutoSig"><span style="font-size:11.0pt"><o:p> </o:p></span></span></p>
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<p class="MsoNormal" style="background:white"><span style="mso-bookmark:x__MailAutoSig"><b><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black">Nick Menounos, </span></b></span><span style="mso-bookmark:x__MailAutoSig"></span><span style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black">PE</span><o:p></o:p></p>
<p class="MsoNormal" style="background:white"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black">MIT.nano - Associate Director of Infrastructure</span><o:p></o:p></p>
<p class="MsoNormal" style="background:white"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:black">Cell: </span><span style="color:black"><a href="tel:+15089320938"><span style="font-size:9.0pt;font-family:"Arial",sans-serif">(508) 932-0938</span></a></span><o:p></o:p></p>
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<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif"> </span><span style="font-size:11.0pt"><o:p></o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Hope Fa-Kaji<br>
<b>Sent:</b> Tuesday, July 7, 2026 1:08 AM<br>
<b>To:</b> Network Fab <labnetwork@mtl.mit.edu><br>
<b>Subject:</b> Re: [labnetwork] Wet Process Station Exhaust Requirements<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Apologies for the typo--below should read FPM not CFM.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">On Mon, Jul 6, 2026 at 10:44<span style="font-family:"Arial",sans-serif"> </span>AM Hope Fa-Kaji <<a href="mailto:hfakaji@lbl.gov">hfakaji@lbl.gov</a>> wrote:<o:p></o:p></p>
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<p class="MsoNormal">Hello all,<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">What standards are your facilities are using for wet bench exhaust and where on the bench are your exhaust measurements are taken? We are particularly interested in the case of wet stations without a sash located inside cleanrooms with
vertical air flow. <o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">The consensus from the <a href="https://mtl.mit.edu/pipermail/labnetwork/2012-April/000426.html" target="_blank">2012 thread discussing this topic</a> was a minimum face velocity of 80-100 CFM (following ANSI Z9.5 or similar requirements
for fume hoods).<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Is anyone using a different minimum velocity? Alternatively, is anyone measuring the capture velocity around the deck openings (i.e. above the baths) instead of the front plane of the bench?<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">I found an old Intel supplier document advising both of these modifications but am curious if anyone has them in practice. <o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Thank you!<o:p></o:p></p>
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<p class="MsoNormal"><span class="gmailsignatureprefix">-- </span><o:p></o:p></p>
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<p class="MsoNormal"><b><span style="font-family:"Georgia",serif">All the best,</span></b><o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="font-family:"Georgia",serif">Hope Fa-Kaji</span><o:p></o:p></p>
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<p class="MsoNormal"><span style="font-family:"Georgia",serif;color:#666666">Semiconductor Equipment Engineer</span><o:p></o:p></p>
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<p class="MsoNormal"><span style="font-family:"Georgia",serif;color:#666666">MicroSystems Laboratory</span><o:p></o:p></p>
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<p class="MsoNormal"><span style="font-family:"Georgia",serif;color:#666666"><img border="0" width="420" height="95" style="width:4.375in;height:.993in" id="_x0000_i1025" src="https://ci3.googleusercontent.com/mail-sig/AIorK4yBx1QCkq_DPrtgR5B_lqZ1t-Y52u9Nq4qfhFi5qkDXBdbcb8OmcM5Is87_HYBHrwehwut24-Put5a8"></span><o:p></o:p></p>
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