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</o:shapelayout></xml><![endif]--></head><body lang=EN-US link="#0563C1" vlink="#954F72"><div class=WordSection1><p class=MsoNormal>Jeff,<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>It barely qualifies as table-top, but this tool works well for us:<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Schott IR Inspection Tool<o:p></o:p></p><p class=MsoNormal><a href="https://www.cnfusers.cornell.edu/node/95">https://www.cnfusers.cornell.edu/node/95</a><o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>We also have a Suss DSM8 for measuring front to back alignment to >500nm but it is currently not functioning. And NOT table top…<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Garry J. Bordonaro<o:p></o:p></p><p class=MsoNormal>Microlithographic Engineer<o:p></o:p></p><p class=MsoNormal>Cornell NanoScale Facility<o:p></o:p></p><p class=MsoNormal>250 Duffield Hall<o:p></o:p></p><p class=MsoNormal>343 Campus Road<o:p></o:p></p><p class=MsoNormal>Ithaca NY 14853-2700<o:p></o:p></p><p class=MsoNormal>(607) 254-4936<o:p></o:p></p><p class=MsoNormal><a href="mailto:bordonaro@cnf.cornell.edu"><span style='color:blue'>bordonaro@cnf.cornell.edu</span></a><o:p></o:p></p><p class=MsoNormal><a href="http://www.cnf.cornell.edu/"><span style='color:blue'>http://www.cnf.cornell.edu/</span></a><o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Please acknowledge CNF in your publications:<o:p></o:p></p><p class=MsoNormal>"This work was performed in part at the Cornell NanoScale Science & Technology Facility (CNF), a member of the National Nanotechnology Coordinated Infrastructure (NNCI), which is supported by the National Science Foundation (Grant NNCI-2025233)."<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><b>From:</b> labnetwork <labnetwork-bounces@mtl.mit.edu> <b>On Behalf Of </b>Jeff McKay<br><b>Sent:</b> Thursday, July 2, 2026 5:17 PM<br><b>To:</b> labnetwork@mtl.mit.edu<br><b>Subject:</b> [labnetwork] Backside Alignment Microscopes<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><div><p class=MsoNormal>Hello All,<o:p></o:p></p><div><p class=MsoNormal><o:p> </o:p></p></div><div><p class=MsoNormal>We currently use Karl Suss MA6 for lithography on the backside of 4" InP wafers. It is critical that we have good back to front side alignment, and right now we can only use the MA6 to verify alignment. <o:p></o:p></p></div><div><p class=MsoNormal><o:p> </o:p></p></div><div><p class=MsoNormal>Unfortunately there is no scale/camera options for outputting to get quantative data from our alignment.<o:p></o:p></p></div><div><p class=MsoNormal><o:p> </o:p></p></div><div><p class=MsoNormal>We are looking for a bench top tool/microscope that would allow us to check alignment after development so that we are getting higher resolution and more quantative results. Does anyone have any recommendations?<o:p></o:p></p></div><div><p class=MsoNormal><o:p> </o:p></p></div><div><p class=MsoNormal>Thanks,<o:p></o:p></p></div><div><p class=MsoNormal>Jeff McKay<o:p></o:p></p></div><div><p class=MsoNormal><o:p> </o:p></p></div><div><p class=MsoNormal>Process Engineer<o:p></o:p></p></div><div><p class=MsoNormal>Global Communications Semiconductor <o:p></o:p></p></div><div><p class=MsoNormal>Torrance, CA<o:p></o:p></p></div></div></div></body></html>