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    We also use TDMAH in our Fiji at UF with no issues.  Very reliable
    end of life and performance.<br>
    <br>
    I too would like to be added to an ALD mail group if possible.<br>
    <br>
    Thank you,<br>
    Brent
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    <div class="moz-cite-prefix">On 8/19/2026 12:10 PM, Frank Flack
      wrote:<br>
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          Hi all,</div>
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          We use TDMAH in our Fiji G2 and have not had delivery issues
          though we do keep the cylinder at elevated temps when idle.</div>
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          Is there a separate ALD group mail or just an informal mailing
          list?  Please add me, if so!</div>
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          Thanks,</div>
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          Frank</div>
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            <br>
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              <span style="color: rgb(0, 0, 0);">Frank S. Flack</span></p>
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              <span style="color: rgb(0, 0, 0);">University of Wisconsin
                Centers for Nanoscale Technology</span></p>
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              <span style="color: rgb(0, 0, 0);">Rm. 3120 Engineering
                Centers Bldg.</span></p>
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              <span style="color: rgb(0, 0, 0);">1550 Engineering Drive</span></p>
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              <span style="color: rgb(0, 0, 0);">Madison, WI 53706</span></p>
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        <div id="divRplyFwdMsg" dir="ltr"><font face="Calibri, sans-serif" style="font-size:11pt" color="#000000"><b>From:</b> labnetwork
            <a class="moz-txt-link-rfc2396E" href="mailto:labnetwork-bounces@mtl.mit.edu"><labnetwork-bounces@mtl.mit.edu></a> on behalf of Martin,
            Michael <a class="moz-txt-link-rfc2396E" href="mailto:michael.martin@louisville.edu"><michael.martin@louisville.edu></a><br>
            <b>Sent:</b> Tuesday, August 18, 2026 4:35 PM<br>
            <b>To:</b> Network Fab <a class="moz-txt-link-rfc2396E" href="mailto:labnetwork@mtl.mit.edu"><labnetwork@mtl.mit.edu></a><br>
            <b>Cc:</b> Stefan Myhajlenko <a class="moz-txt-link-rfc2396E" href="mailto:myhajlenko@asu.edu"><myhajlenko@asu.edu></a>;
            dleber <a class="moz-txt-link-rfc2396E" href="mailto:dleber@vt.edu"><dleber@vt.edu></a>; Yu <a class="moz-txt-link-rfc2396E" href="mailto:ywu387@gatech.edu"><ywu387@gatech.edu></a>;
            a-dhote <a class="moz-txt-link-rfc2396E" href="mailto:a-dhote@northwestern.edu"><a-dhote@northwestern.edu></a>; Chen, Zhi D.
            <a class="moz-txt-link-rfc2396E" href="mailto:zhi.chen@uky.edu"><zhi.chen@uky.edu></a>; Gary
            <a class="moz-txt-link-rfc2396E" href="mailto:gary.spinner@ien.gatech.edu"><gary.spinner@ien.gatech.edu></a>; Bill Mitchell
            <a class="moz-txt-link-rfc2396E" href="mailto:mitchell@ece.ucsb.edu"><mitchell@ece.ucsb.edu></a>; Morris, JD
            <a class="moz-txt-link-rfc2396E" href="mailto:james.morris.3@louisville.edu"><james.morris.3@louisville.edu></a>; Tony Whipple
            <a class="moz-txt-link-rfc2396E" href="mailto:whipp003@umn.edu"><whipp003@umn.edu></a><br>
            <b>Subject:</b> [labnetwork] Some info on HfO2 precursors</font>
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            Hi Labnetwork:  </div>
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               I wanted to summarize some advice from our informal ALD
            working group (formerly NNCI ALD group I think)  about HfO2
            precursors so that this info will be in the labnet archive
            and available in the Labnetwork chatbot.  </div>
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            "I see there are something like 4 Hf precursors that folks
            have used in the literature. </div>
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                TEMAHf 
                 (Tetrakis(ethylmethylamido)hafnium(IV),(EtMeN)4Hf) </div>
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                Tris(dimethylamido)cyclopentadienyl Hafnium, HfCp(NMe2)3
                (HyALD)</div>
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                Tetrakis(dimethylamido)hafnium(IV) [TDMAH]</div>
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                And a chlorinated Hf compound.  </div>
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            We have some limited experience with TDMAH but Beneq
            suggests TEMAHf or HyALD is more stable.  What is your go-to
            Hf precursor? "   </div>
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            Tony Whiple from Minnesota pointed out that they:</div>
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            "use Tetrakis(dimethylamido)hafnium(IV) [TDMAH]  in all of
            our ALD systems, Savannah, Lesker, Fiji. We continue to keep
            with the same precursors as users have set processes for
            that. </div>
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            <br>
            We have had a few issues with using this, mainly the random
            end of service of the precursor.<br>
            The causes of the cylinder going bad ( not able to pulse
            material, while the cylinder is only half empty ) can at
            times be assigned to the cylinder heat being turned off and
            going to room temperature.  After reheating to the correct
            temperature, there is a chance the cylinder will go bad.  We
            have had this happen only a few times.  To keep this from
            happening, we avoid having the cylinders cool off."  </div>
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            Evidently others (Mac from Harvard and Bangzhi from PSU)
            have had similar problems with TDMAH- incidentally this is a
            big problem with the SnO2 precursor TDMASn.  Mac suggests
            loading only a small amount of TDMAH at a time, and Bangzhi
            suggested that sometimes cycling the manual valve to the
            bottle may free up the delivery line.  </div>
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            My inclination based on this advice is to try the <span style="color:rgb(0,0,0)">
              TEMAHf 
               (Tetrakis(ethylmethylamido)hafnium(IV),(EtMeN)4Hf) option
              given that we may not have super high throughput so a
              stable precursor might be important in our case and Beneq
              has provided a starting recipe.  Generally, my impression
              is that the chlorinated precursors can cause problems with
              the plumbing and pumps since the reaction yields HCl . </span></div>
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            I'd love to hear any other advice people may want to share
            on this process and precursors.  </div>
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              <p style="direction:ltr; margin-top:0px; margin-bottom:0px"><span style="font-family:Calibri,Helvetica,sans-serif; font-size:12pt; color:rgb(0,0,0)">Regards,</span></p>
              <p style="direction:ltr; margin-top:0px; margin-bottom:0px"><span style="font-family:Calibri,Helvetica,sans-serif; font-size:12pt; color:rgb(0,0,0)">  
                  Michael Martin, Ph.D.</span></p>
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              <p style="direction:ltr; margin-top:0px; margin-bottom:0px">Manager,
                <span style="font-family:Calibri,Helvetica,sans-serif; font-size:12pt; color:rgb(0,0,0)">
                  Micro/Nano Technology Center</span></p>
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                  of Louisville</span></p>
              <div style="direction:ltr; font-family:Calibri,sans-serif; font-size:11pt; color:rgb(0,0,0)">
                (502) 552-1945</div>
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      <pre wrap="" class="moz-quote-pre">_______________________________________________
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