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<p class="MsoNormal"><span style="font-size:11.0pt">Hello,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">We use TDMAH also for our new Fiji G2 at Ohio State. We have limited data with it but so far, so good.
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">We have a VERY old PicoSun Sunale 150 and used a precursor from EMD/SAFC that they call HFCMMM. Chemical name is Bis(methylcyclopenta-dienyl) Methoxymethyl Hafnium. It is a solid. That PicoSun has/had a heated
source made for sources like this called PicoSolid. The precursor works well when first installed but quickly changes colors and/or blocked the plumbing lines. We believe this is due to the PicoSolid itself, not necessarily the precursor. The tooling for the
PicoSolid is not a bubbler or cylinder, but a set of two glass cylinders with a frit, o-ring, and ceramic spacer. The seal to the ALD is another O-ring. This tooling was intended for true research where you’d install a precursor, use it immediately, then remove
it. Basically, for ALD precursor development. This is not how we used it and that caused problems. In any event, just adding this other precursor to the mix. I see no reason to continue using it now that we have the Fiji and TDMAH. But I am very interested
in this issue.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">Would love to be added to an ALD group if there is one.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">Best,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">Aimee<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">Aimee Bross Price<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">Manager, Nanofabrication<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">The Ohio State University<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">Nanotech West Lab<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">Institute for Materials and Manufacturing Research<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">1381 Kinnear Road<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">Suite 100<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">Columbus, OH 43212<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">614-292-2753<o:p></o:p></span></p>
<p class="MsoNormal"><u><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#C00000"><a href="mailto:Price.798@osu.edu"><span style="color:#C00000">Price.798@osu.edu</span></a></span></u><span style="font-size:11.0pt;font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#C00000">Nanotech.osu.edu</span><span style="font-size:11.0pt;font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif"> <o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#3F4443">Pronouns: she/her/hers</span><span style="font-size:11.0pt;font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif"> </span><span style="font-size:11.0pt"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Gila,Brent P<br>
<b>Sent:</b> Wednesday, August 19, 2026 5:20 PM<br>
<b>To:</b> Frank Flack <fsflack@wisc.edu>; Martin, Michael <michael.martin@louisville.edu>; Network Fab <labnetwork@mtl.mit.edu><br>
<b>Cc:</b> Yu <ywu387@gatech.edu>; Stefan Myhajlenko <myhajlenko@asu.edu>; dleber <dleber@vt.edu>; Morris, JD <james.morris.3@louisville.edu>; a-dhote <a-dhote@northwestern.edu>; Chen, Zhi D. <zhi.chen@uky.edu>; Gary <gary.spinner@ien.gatech.edu>; Tony Whipple
<whipp003@umn.edu>; Bill Mitchell <mitchell@ece.ucsb.edu><br>
<b>Subject:</b> Re: [labnetwork] Some info on HfO2 precursors<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal" style="mso-line-height-alt:.75pt"><span style="font-size:1.0pt;color:white">We also use TDMAH in our Fiji at UF with no issues. Very reliable end of life and performance. I too would like to be added to an ALD mail group if possible. Thank
you, Brent On 8/19/2026 12:</span><span style="font-size:1.0pt;font-family:"Arial",sans-serif;color:white"> </span><span style="font-size:1.0pt;color:white">10 PM, Frank Flack wrote: [External Email] Hi all,<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-line-height-alt:.75pt"><span style="font-size:1.0pt;color:white"><o:p></o:p></span></p>
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<p class="MsoNormal">We also use TDMAH in our Fiji at UF with no issues. Very reliable end of life and performance.<br>
<br>
I too would like to be added to an ALD mail group if possible.<br>
<br>
Thank you,<br>
Brent <o:p></o:p></p>
<p class="MsoNormal"><br>
<img border="0" width="528" height="179" style="width:5.5in;height:1.8645in" id="Picture_x0020_1" src="cid:image001.png@01DD308D.CD708BD0"><o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">On 8/19/2026 12:10 PM, Frank Flack wrote:<o:p></o:p></p>
<blockquote style="margin-top:5.0pt;margin-bottom:5.0pt">
<p class="MsoNormal"><b><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#FA4616">[External Email]</span></b>
<o:p></o:p></p>
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<p class="MsoNormal"><span style="color:black">Hi all,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:black">We use TDMAH in our Fiji G2 and have not had delivery issues though we do keep the cylinder at elevated temps when idle.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:black">Is there a separate ALD group mail or just an informal mailing list? Please add me, if so!<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:black">Thanks,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black">Frank<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
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<p class="elementtoproof" style="background:white"><span style="font-family:"Calibri",sans-serif;color:black">Frank S. Flack</span><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="elementtoproof" style="background:white"><span style="font-family:"Calibri",sans-serif;color:black">University of Wisconsin Centers for Nanoscale Technology</span><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="elementtoproof" style="background:white"><span style="font-family:"Calibri",sans-serif;color:black">Rm. 3120 Engineering Centers Bldg.</span><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="elementtoproof" style="background:white"><span style="font-family:"Calibri",sans-serif;color:black">1550 Engineering Drive</span><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
<p class="elementtoproof" style="background:white"><span style="font-family:"Calibri",sans-serif;color:black">Madison, WI 53706</span><span style="font-family:"Calibri",sans-serif"><o:p></o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:black">From:</span></b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:black"> labnetwork
<a href="mailto:labnetwork-bounces@mtl.mit.edu"><labnetwork-bounces@mtl.mit.edu></a> on behalf of Martin, Michael
<a href="mailto:michael.martin@louisville.edu"><michael.martin@louisville.edu></a><br>
<b>Sent:</b> Tuesday, August 18, 2026 4:35 PM<br>
<b>To:</b> Network Fab <a href="mailto:labnetwork@mtl.mit.edu"><labnetwork@mtl.mit.edu></a><br>
<b>Cc:</b> Stefan Myhajlenko <a href="mailto:myhajlenko@asu.edu"><myhajlenko@asu.edu></a>; dleber
<a href="mailto:dleber@vt.edu"><dleber@vt.edu></a>; Yu <a href="mailto:ywu387@gatech.edu">
<ywu387@gatech.edu></a>; a-dhote <a href="mailto:a-dhote@northwestern.edu"><a-dhote@northwestern.edu></a>; Chen, Zhi D.
<a href="mailto:zhi.chen@uky.edu"><zhi.chen@uky.edu></a>; Gary <a href="mailto:gary.spinner@ien.gatech.edu">
<gary.spinner@ien.gatech.edu></a>; Bill Mitchell <a href="mailto:mitchell@ece.ucsb.edu">
<mitchell@ece.ucsb.edu></a>; Morris, JD <a href="mailto:james.morris.3@louisville.edu">
<james.morris.3@louisville.edu></a>; Tony Whipple <a href="mailto:whipp003@umn.edu">
<whipp003@umn.edu></a><br>
<b>Subject:</b> [labnetwork] Some info on HfO2 precursors</span> <o:p></o:p></p>
<p class="MsoNormal"> <o:p></o:p></p>
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<p class="MsoNormal"><span style="color:black">Hi Labnetwork: <o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"> I wanted to summarize some advice from our informal ALD working group (formerly NNCI ALD group I think) about HfO2 precursors so that this info will be in the labnet archive and available in the Labnetwork
chatbot. <o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:black">"I see there are something like 4 Hf precursors that folks have used in the literature. <o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<div>
<ol style="margin-top:0in" start="1" type="1">
<li class="MsoNormal" style="color:black;mso-list:l0 level1 lfo1">TEMAHf (Tetrakis(ethylmethylamido)hafnium(IV),(EtMeN)4Hf) <o:p></o:p></li></ol>
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<ol style="margin-top:0in" start="2" type="1">
<li class="MsoNormal" style="color:black;mso-list:l0 level1 lfo1">Tris(dimethylamido)cyclopentadienyl Hafnium, HfCp(NMe2)3 (HyALD)<o:p></o:p></li></ol>
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<ol style="margin-top:0in" start="3" type="1">
<li class="MsoNormal" style="color:black;mso-list:l0 level1 lfo1">Tetrakis(dimethylamido)hafnium(IV) [TDMAH]<o:p></o:p></li></ol>
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<ol style="margin-top:0in" start="4" type="1">
<li class="MsoNormal" style="color:black;mso-list:l0 level1 lfo1">And a chlorinated Hf compound. <o:p></o:p></li></ol>
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<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:black">We have some limited experience with TDMAH but Beneq suggests TEMAHf or HyALD is more stable. What is your go-to Hf precursor? " <o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:black">Tony Whiple from Minnesota pointed out that they:<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black">"use Tetrakis(dimethylamido)hafnium(IV) [TDMAH] in all of our ALD systems, Savannah, Lesker, Fiji. We continue to keep with the same precursors as users have set processes for that. <o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><br>
We have had a few issues with using this, mainly the random end of service of the precursor.<br>
The causes of the cylinder going bad ( not able to pulse material, while the cylinder is only half empty ) can at times be assigned to the cylinder heat being turned off and going to room temperature. After reheating to the correct temperature, there is a
chance the cylinder will go bad. We have had this happen only a few times. To keep this from happening, we avoid having the cylinders cool off." <o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:black">Evidently others (Mac from Harvard and Bangzhi from PSU) have had similar problems with TDMAH- incidentally this is a big problem with the SnO2 precursor TDMASn. Mac suggests loading only a small amount of TDMAH
at a time, and Bangzhi suggested that sometimes cycling the manual valve to the bottle may free up the delivery line. <o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:black">My inclination based on this advice is to try the TEMAHf (Tetrakis(ethylmethylamido)hafnium(IV),(EtMeN)4Hf) option given that we may not have super high throughput so a stable precursor might be important in
our case and Beneq has provided a starting recipe. Generally, my impression is that the chlorinated precursors can cause problems with the plumbing and pumps since the reaction yields HCl . <o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:black">I'd love to hear any other advice people may want to share on this process and precursors. <o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<div id="x_x_Signature">
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<p><span style="font-family:"Calibri",sans-serif;color:black">Regards,</span><o:p></o:p></p>
<p><span style="font-family:"Calibri",sans-serif;color:black"> Michael Martin, Ph.D.</span><o:p></o:p></p>
<p class="MsoNormal"><span style="font-family:"Calibri",sans-serif;color:black"><o:p> </o:p></span></p>
<p>Manager, <span style="font-family:"Calibri",sans-serif;color:black">Micro/Nano Technology Center</span><o:p></o:p></p>
<p><span style="font-family:"Calibri",sans-serif;color:black">University of Louisville</span><o:p></o:p></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:black">(502) 552-1945<o:p></o:p></span></p>
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<pre>_______________________________________________<o:p></o:p></pre>
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