<div dir="ltr"><div dir="ltr"><div>Dear Colleagues:</div><div><br></div><div>You are cordially invited to attend our 1<b>0th Meeting for Advanced Electron Beam Lithography</b> (MAEBL), hosted this year by our friends at UC Berkeley, in Berkeley, California, USA, <b>October 13–15, 2026</b>. Attendees have the option to attend online as well. Visit <a href="http://maebl.org" target="_blank">maebl.org</a> to learn more.</div><div><br></div><div>Call to Action:</div><div><ul><li><a href="https://www.eventbrite.com/e/the-10th-meeting-for-advanced-electron-beam-lithography-maebl-registration-1981601897619?aff=oddtdtcreator" target="_blank">Register for MAEBL 2026</a> to attend in person or online.</li><li><a href="https://reservations.hotelshattuckplaza.com/book/dates-of-stay?groupID=5367441" target="_blank">Book Your Hotel Room by September 28th ($189/night)</a> </li><li><a href="https://drive.google.com/file/d/161Q8b35v4uNAUnSj-qZJ-FeLx32S9ZfN/preview" target="_blank">View Program</a></li><li>Follow on LinkedIn: <a href="https://www.linkedin.com/company/maebl" target="_blank">https://www.linkedin.com/company/<span>maebl</span></a></li></ul></div><div><span style="background-color:transparent">This year's speakers and topics include:</span></div><div><ul><li><span style="background-color:transparent">Day 0 (half-day for those arriving early)</span></li><ul><li><span style="background-color:transparent">Tour: Marvell NanoLab at CITRIS </span><span style="background-color:transparent">(In-Person Only)</span></li><li><span style="background-color:transparent">Panel: Comparison of Calendaring Systems, including FBS, iLabs, NEMO-CE, and MERCURY</span></li><ul><li><span style="background-color:transparent">Gerald Lopez, University of Pennsylvania</span></li><li><span style="background-color:transparent">Justin Wirth, Purdue University</span></li><li><span style="background-color:transparent">Guy DeRose, Caltech</span></li><li><span style="background-color:transparent">Allison Dove, UC Berkeley</span></li></ul></ul><li>Day 1: Foundations Workshop</li><ul><li>The Importance of the Process Window in Nanofabrication by Fabien Grisé, Penn State </li><li>Process Control for Electron Beam Lithography by Devin Brown, Georgia Tech</li><li>I Wanna Go Fast!  Can Gaussian Beam EBL Ever Be Considered <i>Fast</i>? by Bill Mitchell, UCSB</li><li>E-beam Patterning of Curved Structures in Diffractive Optic Applications by Weilun Chao, Lawrence Berkeley National Laboratory</li><li>Optimised Writing Strategies for Quantum Integrated Photonics by Daniel Peace, The University of Queensland</li><li>Lessons Learned Transferring Electron Beam Lithography Processes Across a 23‑Year Gap Between Tool Platforms by Andres Paniagua, Teledyne Scientific Company</li><li>Common Challenges Open Discussion led by Mason Risley of Sandia and Joseph Christodoulides of Navy Research </li></ul><li>Day 2: Core Meeting</li><ul><li>Fabricating an Ultra-Low Blaze Angle Diffraction Grating for a NASA Telescope with LLM-assisted Characterization by Fabien Grisé, Penn State</li><li>An Introduction to E-beam Direct Write Using High Order Substrate Mapping by Ivan Milosavljevic, HRL Laboratories</li><li>Design Considerations for Metal Assisted Chemically Etched Devices by Anne Sakdinawat, SLAC</li><li>Challenges and Recent Progress with High Energy Beam Sensitive (HEBS) Glass by Jenny Zhou, Lawrence Livermore National Laboratory</li><li>Improving Weak Marker Detection using Computer Vision Techniques by Bingcheng Suo, Stanford University</li><li>AutoSEM: Critical Dimension and Line Edge Roughness Metrology Using Automated Scanning Electron Microscopy by Will Gunn, The University of Queensland</li><li>Common Challenges Open Discussion led by Mark Mondol of MIT</li></ul></ul></div><div>Sincerely,<br>Gerald G. Lopez, Ph.D. <br>Co-Founder and Board Chair, MAEBL</div><div><div dir="ltr" class="gmail_signature" data-smartmail="gmail_signature"><div dir="ltr"><span><div dir="ltr" style="margin-left:0pt" align="left"><span><div dir="ltr" style="margin-left:0pt" align="left"><span><div dir="ltr" style="margin-left:0pt" align="left"><table style="border-width:medium;border-style:none;border-color:currentcolor;border-collapse:collapse;table-layout:fixed;width:468pt"><colgroup><col width="161"><col></colgroup><tbody><tr style="height:0pt"><td style="border-right:0.5pt solid rgb(217,217,217);vertical-align:top;padding:5pt;overflow:hidden"><p dir="ltr" style="line-height:1.2;text-align:right;margin-top:0pt;margin-bottom:0pt"><br></p><p dir="ltr" style="line-height:1.2;text-align:right;margin-top:0pt;margin-bottom:0pt"><span style="font-size:11pt;font-family:Arial,sans-serif;color:rgb(17,85,204);background-color:transparent;font-variant:normal;text-decoration:underline;vertical-align:baseline;white-space:pre-wrap"><img src="cid:ii_1a08bba879001" width="147" height="44" style="border-width:medium;border-style:none;border-color:currentcolor"></span><span style="font-size:3pt;font-fa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