<html aria-label="message body"><head><meta http-equiv="content-type" content="text/html; charset=utf-8"></head><body style="overflow-wrap: break-word; -webkit-nbsp-mode: space; line-break: after-white-space;">Hi, Everyone,<div><br></div><div>Two questions for you.</div><div><br></div><div>(1) At UC Davis we are trying to acquire a tool that can spin coat and spray coat photoresist. Do you have a good recommendation for a new tool or used one for less than 200k, preferably below 140k?</div><div>I received a quotation from EVG for a new tool EVG101. We like what we saw on the spec sheet and descriptions but the price is a bit on the high side for us. Looking for a used unit, I got a quote for an old unit that is not supported (and we need to purchase one that has manufacturers’ support and maintenance).</div><div>Any suggestion would be appreciated.</div><div><br></div><div>(2) We are also trying to setup a bilevel resist exposure capability for high resolution metal liftoff. My group members have been using LOR under the photoresist to give an undercut under the photoresist during the development but it is not a well-controlled process.</div><div>At my former lab, Bellcore, two types of photoresist : <span class="rQesXe MPyX" data-sfc-cp="" jsaction="" jscontroller="tP2kf#s32ZS" data-sfc-root="ep" jsuid="IjqcGf_6g" data-copy-service-computed-style="font-family: "Google Sans", "Helvetica Neue", sans-serif; font-size: 16px; font-weight: 700; margin: 0px; text-decoration: none; border-bottom: 0px rgb(230, 232, 240);" style="font-family: "Google Sans", "Helvetica Neue", sans-serif; margin: 0px; border-bottom: 0px rgb(230, 232, 240);">g-line (436 nm)</span> and <span class="rQesXe MPyX" data-sfc-cp="" jsaction="" jscontroller="tP2kf#s32ZS" data-sfc-root="ep" jsuid="IjqcGf_6h" data-copy-service-computed-style="font-family: "Google Sans", "Helvetica Neue", sans-serif; font-size: 16px; font-weight: 700; margin: 0px; text-decoration: none; border-bottom: 0px rgb(230, 232, 240);" style="font-family: "Google Sans", "Helvetica Neue", sans-serif; margin: 0px; border-bottom: 0px rgb(230, 232, 240);">i-line (365 nm). After the I-line litho and development, using g-line flood exposure at angled spin exposure worked very well.</span></div><div><span class="rQesXe MPyX" data-sfc-cp="" jsaction="" jscontroller="tP2kf#s32ZS" data-sfc-root="ep" jsuid="IjqcGf_6h" data-copy-service-computed-style="font-family: "Google Sans", "Helvetica Neue", sans-serif; font-size: 16px; font-weight: 700; margin: 0px; text-decoration: none; border-bottom: 0px rgb(230, 232, 240);" style="font-family: "Google Sans", "Helvetica Neue", sans-serif; margin: 0px; border-bottom: 0px rgb(230, 232, 240);">Anyone knows of a good g-line exposure system for bilevel liftoff?</span></div><div><span class="rQesXe MPyX" data-sfc-cp="" jsaction="" jscontroller="tP2kf#s32ZS" data-sfc-root="ep" jsuid="IjqcGf_6h" data-copy-service-computed-style="font-family: "Google Sans", "Helvetica Neue", sans-serif; font-size: 16px; font-weight: 700; margin: 0px; text-decoration: none; border-bottom: 0px rgb(230, 232, 240);" style="font-family: "Google Sans", "Helvetica Neue", sans-serif; margin: 0px; border-bottom: 0px rgb(230, 232, 240);">We also use DUV ASML stepper, hence we could also try </span><span class="rQesXe MPyX" data-sfc-cp="" jsaction="" jscontroller="tP2kf#s32ZS" data-sfc-root="ep" jsuid="IjqcGf_6g" data-copy-service-computed-style="font-family: "Google Sans", "Helvetica Neue", sans-serif; font-size: 16px; font-weight: 700; margin: 0px; text-decoration: none; border-bottom: 0px rgb(230, 232, 240);" style="font-family: "Google Sans", "Helvetica Neue", sans-serif; margin: 0px; border-bottom: 0px rgb(230, 232, 240);">g-line (436 nm) and DUV (248 nm) bilevel liftoff.</span></div><div><span class="rQesXe MPyX" data-sfc-cp="" jsaction="" jscontroller="tP2kf#s32ZS" data-sfc-root="ep" jsuid="IjqcGf_6g" data-copy-service-computed-style="font-family: "Google Sans", "Helvetica Neue", sans-serif; font-size: 16px; font-weight: 700; margin: 0px; text-decoration: none; border-bottom: 0px rgb(230, 232, 240);" style="font-family: "Google Sans", "Helvetica Neue", sans-serif; margin: 0px; border-bottom: 0px rgb(230, 232, 240);"><br></span></div><div><font face="Google Sans, Helvetica Neue, sans-serif">Any suggestion would be appreciated.</font></div><div><font face="Google Sans, Helvetica Neue, sans-serif"><br></font></div><div><font face="Google Sans, Helvetica Neue, sans-serif">Thanks,</font></div><div><font face="Google Sans, Helvetica Neue, sans-serif"><br></font></div><div><font face="Google Sans, Helvetica Neue, sans-serif">-Ben</font></div><div><br></div><br><br><div>
<meta charset="UTF-8"><div dir="auto" style="caret-color: rgb(0, 0, 0); color: rgb(0, 0, 0); letter-spacing: normal; text-align: start; text-indent: 0px; text-transform: none; white-space: normal; word-spacing: 0px; -webkit-text-stroke-width: 0px; text-decoration: none; word-wrap: break-word; -webkit-nbsp-mode: space; line-break: after-white-space;"><div style="word-wrap: break-word; -webkit-nbsp-mode: space; line-break: after-white-space;">_______________________________________________________________________________<br><br>S. J. Ben Yoo<br>Joint Faculty LBL and UC Davis <br>Distinguished Professor, Department of Electrical and Computer Engineering<br>Room 3110, Kemper Hall<br>Mail Code 1915<br>University of California<br>Davis, California 95616<br>Mobile: (510) 407-2457<br>Fax: (530) 752-8428<br>email: sbyoo@ucdavis.edu<br>home page: http://sierra.ece.ucdavis.edu<br>_______________________________________________________________________________ </div></div>
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