<div dir="ltr"><div dir="ltr"><div><p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><span style="font-size:11pt;line-height:115%">Dear Colleagues,</span></p>

<p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><span style="font-size:11pt;line-height:115%">The <b>North
American Plasma Etch Exchange (NAPEX)</b> is pleased to invite you to our
upcoming <b>virtual symposium</b>, <b>“Frontiers in Nanoscale Plasma Etching,”</b>
taking place <b>October 20–21, 2026, from 1:00–4:10 PM ET each day</b>.</span></p>

<p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><span style="font-size:11pt;line-height:115%">This two-day
symposium will bring together researchers and professionals from <b>academia,
industry, nanofabrication facilities, and the semiconductor community</b> to
exchange knowledge and discuss recent developments and emerging challenges in
plasma etching and atomic layer processing.</span></p>

<p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><span style="font-size:11pt;line-height:115%">The program
features invited speakers representing <b>Applied Materials, Silicon Austria
Labs, Oxford Instruments, University of Nevada Reno, UC Berkeley, SENTECH,
AlixLabs, Caltech, IonQ, Engenius Micro, Georgia Tech, and UCSB</b>.</span></p>

<p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><span style="font-size:11pt;line-height:115%">The
technical program will cover topics including <b>atomic layer etching (ALE),
plasma-enhanced atomic layer processes, advanced semiconductor manufacturing,
ferroelectric materials, wide-bandgap materials, SiC, lithium niobate and
diamond etching, advanced logic and memory technologies, and emerging
plasma-processing applications</b>.</span></p><p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><span style="font-size:11pt;line-height:115%"><br></span></p>

<p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><b><span style="font-size:11pt;line-height:115%">Registration (free):</span></b><span style="font-size:11pt;line-height:115%"><br>
</span><a href="https://docs.google.com/forms/d/e/1FAIpQLSfZAfvSjEE48ldxSiTaOgf4S8qSQY9e_cCWegHbZbNWUmhQvw/viewform" target="_blank"><span style="font-size:11pt;line-height:115%"><font color="#ff0000"><b>Register for the NAPEX Virtual Symposium</b></font></span></a><span style="font-size:11pt;line-height:115%"></span></p>

<p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><b><span style="font-size:11pt;line-height:115%">Full
program and event information:</span></b><span style="font-size:11pt;line-height:115%"><br>
</span><a href="https://sites.google.com/view/napex-plasma-etch-exchange/upcoming-events-oct-20th" target="_blank"><span style="font-size:11pt;line-height:115%"><b><font color="#ff0000">Frontiers in Nanoscale Plasma Etching – Event Page</font></b></span></a><span style="font-size:11pt;line-height:115%"></span></p><p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><br></p>

<p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><span style="font-size:11pt;line-height:115%">We encourage
<b>faculty, researchers, students, cleanroom and nanofabrication staff, process
engineers, and semiconductor professionals</b> to participate.</span></p>

<p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><b><span style="font-size:11pt;line-height:115%">Please
feel free to forward this invitation to your colleagues, students, research
groups, and professional networks who may be interested.</span></b><span style="font-size:11pt;line-height:115%"></span></p>

<p class="MsoNormal" style="margin:0in 0in 8pt;line-height:115%;font-size:12pt;font-family:Aptos,sans-serif"><span style="font-size:11pt;line-height:115%">We look
forward to seeing you at the symposium.</span></p></div><span class="gmail_signature_prefix">-- </span><br><div dir="ltr" class="gmail_signature" data-smartmail="gmail_signature"><div dir="ltr"><p><strong>NAPEX Team</strong><br><strong>North American Plasma Etch Exchange (NAPEX)</strong></p><p><strong>Vincent Genova</strong> — Cornell University (Retired)<br><strong>Ling Xie</strong> — Harvard University<br><strong>Lavendra Mandyam</strong> — Stanford University<br><strong>Durga Gajula</strong> — Georgia Tech</p><p>🌐 <strong><a href="https://sites.google.com/view/napex-plasma-etch-exchange/" target="_blank">NAPEX Website</a></strong><br>🔗 <strong><a href="https://www.linkedin.com/company/north-american-plasma-etch-exchange-napex" target="_blank">Follow NAPEX on LinkedIn</a></strong></p></div></div></div>
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