[labnetwork] II-VI Semiconductor Dry Etching

[Kevin McPeak]

Dear Colleagues,

My laboratory at ETH Zurich is interested in plasma etching films of
various II-VI semiconductor materials, specifically: CdSe, CdS, ZnSe
and ZnS. Due to the toxicity of these materials (specifically the Cd
based compounds) we are having a hard time finding a cleanroom/machine
that will allow this work. The gases we require for plasma etching
these materials are CH4 and H2.

Ideally, we are looking for an individual or group that has experience
etching these materials that is interested in collaborating with us. I
would be happy to provide more details about our project with
interested parties.

Please let me know if you are interested.

Regards,
Kevin McPeak

--
Kevin McPeak Ph.D.
Postdoctoral Researcher
ETH Zürich
Optical Materials Engineering Laboratory
Universitätstrasse 6, CNB F121
CH-8092 Zurich, Switzerland
Voice: +41 44 632 6594
Email: kmcpeak at ethz.ch