[labnetwork] Nanoimprint lithography tool assessment

[Kevin McPeak]

Dear Colleagues,

The joint ETH/IBM cleanroom is looking into purchasing a dedicated
nanoimprint lithography tool. Our two main criteria is that system can
do step-and-flash imprinting over large areas and that the system has
excellent parallelism (e.g. step and flash a 5 mm x 5 mm stamp with
~400 nm features  over a 4" wafer)

Two models we are looking at are:
- Molecular Imprints Imprio 55
- Nanonex NX-3000

I would greatly appreciate NIL manufacturer and model recommendations
based on the above requirements. Thanks in advance!

Regards,
Kevin McPeak

-- 
Kevin McPeak Ph.D.
Postdoctoral Researcher
ETH Zürich
Optical Materials Engineering Laboratory
Universitätstrasse 6, CNB F121
CH-8092 Zurich, Switzerland
Voice: +41 44 632 6594
Email: kmcpeak at ethz.ch