[labnetwork] ZEP-520A7 e-beam resist

Wed Jun 1 10:02:47 EDT 2016

Hi,

Thank you so much for your suggestions.

I worry that the charged particles generated during sputtering will expose
the resist and reduce the contrast of the ebeam resist. Have you seen
problems with exposure with sputter Al or Au, especially for ZEP as ZEP is
more sensitive resist than PMMA with lower clearing dose.

Thanks again for your help.

Edmond

On Tue, May 31, 2016 at 10:04 PM, Matt Moneck <mmoneck at andrew.cmu.edu>
wrote:

> Hi Edmond,
>
>
>
> To add to Michael’s comment, we have used a similar approach with 10nm of
> sputtered Al on PMMA.  After exposure, we remove the Al with standard
> potassium hydroxide or TMAH based developers, such as AZ400k or MF-CD26.
> The PMMA can then be developed in MIBK/IPA without issue.
>
>
>
> Best Regards,
>
>
>
> Matt
>
>
>
> --
> *Matthew T. Moneck, Ph.D.*
> Executive Manager, Carnegie Mellon Nanofabrication Facility
> Electrical and Computer Engineering | Carnegie Mellon University
> 5000 Forbes Ave., Pittsburgh, PA 15213-3890
> T: 412.268.5430
> F: 412.268.3497
> www.ece.cmu.edu
> nanofab.ece.cmu.edu
>
>
>
> *From:* labnetwork-bounces at mtl.mit.edu [mailto:
> labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Michael Rooks
> *Sent:* Tuesday, May 31, 2016 4:12 PM
> *To:* labnetwork at mtl.mit.edu
>
> *Subject:* Re: [labnetwork] ZEP-520A7 e-beam resist
>
>
>
> For pmma and zep we simply sputter 20nm Au on top, then later remove it
> with KI/I gold etch (from Transene).
>
> For HSQ on insulators we use our own mixture of PSS, a water soluble
> polymer, with gold on top. You can find the details here
> <http://nano.yale.edu/sites/default/files/files/pssa.pdf>. It's very
> cheap.
>
>
> --------------------------------
> Michael Rooks
> Yale Institute of Nanoscience and Quantum Engineering
> nano.yale.edu
>
>
> On 05/31/2016 12:38 PM, Edmond Chow wrote:
>
> Hi,
>
>
>
> I have a related question about ebeam resist. I have been using AquaSAVE
> as anticharging layer for ebeam lithography.
>
> However, I can't seem to find the distributor which will sell AquaSAVE in
> US
>
>
>
> Do you have any information about how to get AquaSAVE from US or any
> replacement for AquaSAVE?
>
>
>
> Thanks in advance.
>
>
>
> Edmond
>
>
>
> On Tue, May 31, 2016 at 9:01 AM, Peter J Duda III <duda at uchicago.edu>
> wrote:
>
> Linda, Leif et al
>
> FYI
>
> GL-2000 has been discontinued recently and is no longer available through
> Gluon Lab.  They claim to be working on other high-performance resists, but
> give no specifics at this time.
>
>
>
> Thanks
>
> Peter J Duda
>
> Technical Manager, Pritzker Nanofabrication Facility
>
> Institute for Molecular Engineering
>
> University of Chicago
>
> 5640 South Ellis Avenue
>
> ERC LL178
>
> Chicago, IL  60637
>
> Office: 773-702-8903
> Pager/Text:  773-652-0480
>
> duda at uchicago.edu
>
> ime.uchicago.edu
> <https://urldefense.proofpoint.com/v2/url?u=http-3A__ime.uchicago.edu&d=AwMFaQ&c=-dg2m7zWuuDZ0MUcV7Sdqw&r=apnDUg1OD9ejswcjrIvVgS28NpQ7-FGy7Sl7_YPlupc&m=xhKoiJKzGjZ4PAyPKU31jYluvUVbH-hwaqX_vwXIYwE&s=txauFZDRNt39sv6hSAlCenH1wfF7k-cTqV80LnAh-lg&e=>
>
>
>
> *From:* labnetwork-bounces at mtl.mit.edu [mailto:
> labnetwork-bounces at mtl.mit.edu] *On Behalf Of *Leif Johansen
> *Sent:* Monday, May 30, 2016 3:52 AM
> *To:* 'Linda Macks' <linda.macks at unsw.edu.au>; labnetwork at mtl.mit.edu
> *Subject:* Re: [labnetwork] ZEP-520A7 e-beam resist
>
>
>
> Hello Linda,
>
>
>
> Last time we purchased ZEP-520 was back in May 2014. We got it from
> Marubeni *The MTL Mail Server has detected a possible fraud attempt from
> "urldefense.proofpoint.com" claiming to be* http://www.marubeni.com/
> <https://urldefense.proofpoint.com/v2/url?u=http-3A__www.marubeni.com_&d=AwMFaQ&c=-dg2m7zWuuDZ0MUcV7Sdqw&r=apnDUg1OD9ejswcjrIvVgS28NpQ7-FGy7Sl7_YPlupc&m=xhKoiJKzGjZ4PAyPKU31jYluvUVbH-hwaqX_vwXIYwE&s=EtvHsu62p-Fb3Flqssz76lbw0w8FOd4Nphxsppe_X1c&e=>
>
> We have actually stopped using ZEP-520 due to the very high price.
> Instead, we have switched to AR-P C-6200 from Allresist GmbH *The MTL
> Mail Server has detected a possible fraud attempt from
> "urldefense.proofpoint.com" claiming to be*
> http://www.allresist.com/csar-62-ar-p-6200/
> <https://urldefense.proofpoint.com/v2/url?u=http-3A__www.allresist.com_csar-2D62-2Dar-2Dp-2D6200_&d=AwMFaQ&c=-dg2m7zWuuDZ0MUcV7Sdqw&r=apnDUg1OD9ejswcjrIvVgS28NpQ7-FGy7Sl7_YPlupc&m=xhKoiJKzGjZ4PAyPKU31jYluvUVbH-hwaqX_vwXIYwE&s=V3R48he1i7j8wgR2Ongk8aobIDJeprgB8ZUFRRlBblE&e=>.
> If you are interested, we can provide you with more process details about
> this resist.
>
> Another alternative would be the gL-2000 from Gluon Lab, which we
> purchased through Fine Material System Inc in Japan. We have tested this
> resist once, but we are not using it routinely in the lab.
>
>
>
> Best regards,
>
> Leif
>
>
>
> *Leif S. Johansen *
>
> Head of Operations
>
> DTU Danchip
>
>
>
> *Technical University of Denmark*
>
> [image: http://www.dtu.dk/images/DTU_email_logo_01.gif]
>
> Danchip
>
> Ørsteds Plads, Byg. 347
>
> 2800  Lyngby
>
> Direct +45 45255713
>
> Mobile +45 25348992
>
> lesjo at danchip.dtu.dk
>
> *The MTL Mail Server has detected a possible fraud attempt from
> "urldefense.proofpoint.com" claiming to be* www.danchip.dtu.dk/
> <https://urldefense.proofpoint.com/v2/url?u=http-3A__www.danchip.dtu.dk_&d=AwMFaQ&c=-dg2m7zWuuDZ0MUcV7Sdqw&r=apnDUg1OD9ejswcjrIvVgS28NpQ7-FGy7Sl7_YPlupc&m=xhKoiJKzGjZ4PAyPKU31jYluvUVbH-hwaqX_vwXIYwE&s=bad6otKPG_IPaLUNRy_wPwTwiOheGoHbLQS8KTbnNz4&e=>
>
>
>
>
>
>
>
>
>
>
>
>
>
>
>
> *From:* labnetwork-bounces at mtl.mit.edu [
> mailto:labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu>] *On
> Behalf Of *Linda Macks
> *Sent:* 28. maj 2016 02:15
> *To:* labnetwork at mtl.mit.edu
> *Subject:* [labnetwork] ZEP-520A7 e-beam resist
>
>
>
> Hello labnetworkers,
>
>
>
> We are having trouble sourcing ZEP-520A7 e-beam resist - if anyone knows
> of a supplier who can deliver to Australia, I would appreciate contact
> details.
>
>
>
> Many thanks,
>
>
>
> Linda
>
>
>
>
>
> *Dr Linda Macks*
>
> Facility Manager, ANFF-NSW
>
> Australian National Fabrication Facility
>
>
>
> School of Electrical Engineering & Telecommunications
>
> University of New South Wales
>
> UNSW Sydney NSW 2052
>
> Australia
>
>
>
> Phone: +61 (2) 9385 7845
>
> Fax: +61(2) 9385 5114
>
> Email: linda.macks at unsw.edu.au
>
>
>
>
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>
>
>
>
>
> --
>
> Edmond Chow
>
>
>
>
> _______________________________________________
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-- 
Edmond Chow
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