[labnetwork] Metamaterials deposition - Ag and SiO2

Zhongrui Wang zhongruiwang at umass.edu
Tue Aug 1 15:52:43 EDT 2017


Hi Esta,

 

I have tried both. Both evaporation and sputtering could do. There should
not be contamination issue. There definitely will be evaporated SiOx
sticking to the sidewall of the evaporator chamber. However they are
chemically stable thus won't react with subsequent metal deposition. The
evaporated SiO2 and sputtered SiO2 are generally porous to some extent. And
the evaporated one seems to be even more porous. 

 

Best,

 

Zhongrui

 

Postdoc ECE UMass

 

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Price, Aimee
Sent: Tuesday, August 1, 2017 9:47 AM
To: Abelev, Esta <eabelev at pitt.edu>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Metamaterials deposition - Ag and SiO2

 

Esta,

We have not, to my knowledge, done multilayer stacks.  However, we do
evaporate SiO2 in our "multi-use" ebeam evaporator but not in the one we use
for metal contacts.  We use a different quartz crystal monitor for SiO2 and
Hafnium oxide than we do for metals.  We have found that using separate
crystals works best to maintain proper z-ratios for both.

 

I've copied our lab manager who has worked extensively on this.  

 

Aimee

 

From: labnetwork-bounces at mtl.mit.edu <mailto:labnetwork-bounces at mtl.mit.edu>
[mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Abelev, Esta
Sent: Monday, July 31, 2017 8:10 PM
To: labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu> 
Subject: [labnetwork] Metamaterials deposition - Ag and SiO2

 

Dear Colleagues,

 

Recently, we got a request to deposit SiO2 and Ag in our e-beam evaporator.
We have only one e-beam UHV evaporator (brand new) which we planned to
dedicate for metals (only). From what was discussed the group is planning to
deposit alternative layers of SiO2 and Ag (10-20nm thick) to ~1micron thick
overall thickness. 

Did anyone have experience with similar multilayer structures, would you
advise me if e-beam evaporation or sputtering would better for this project?

If we will have to go with evaporation of SiO2, will it have contamination
issues with metal deposition?

 

Thanks for advice, Esta

 

-----------------------

Esta Abelev, PhD

Technical Director, Petersen Institute of NanoScience and Engineering 

University of Pittsburgh | 3700 O'Hara Street | 636| Pittsburgh, PA 15261

412-383-4096 |  <mailto:eabelev at pitt.edu> eabelev at pitt.edu |
<https://na01.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.nano.pi
tt.edu%2F&data=01%7C01%7Ceabelev%40pitt.edu%7C9f5bd58ba84940765cf308d4024fbe
18%7C9ef9f489e0a04eeb87cc3a526112fd0d%7C1&sdata=3KfbG5VbshqdoIAPxvX%2F2s1UeU
7ultmBoZmm%2FaZ2Itc%3D&reserved=0> nano.pitt.edu

 

 

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