[labnetwork] Deposit SiNx on ALD Al2O3

[Chen Yulong (Frank)]

Dear All,

I would like to use LPCVD to deposit low stress silicon nitride on Al2O3 (deposit by ALD). It is safe for Al2O3 to against the by product "HCl" from the Precursor DCS and NH3.

Thanks.

I have found a document on the snf website of standford, it seems that ALD Al2O3 is safe in the LPCVD silicon nitride process.



陈宇龙(CHEN Yulong) PhD Student
Department of Materials Science and Engineering
SUSTech  http://www.sustc.edu.cn/en/
Tel: +86-18589050065
 
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