[labnetwork] ICP etch of LiNbO3

[Bernard Alamariu]

Hello,
The system will get contaminated with Alkali metal Lithium which is a 
highly mobile ion in Si, SiO2
and actually it is worst than Sodium for Si based devices.
Thanks, Bernard

On 1/18/18 2:28 PM, Horng, Paul S. wrote:
>
> Hi,
>
> Has anyone had experience with plasma etching of LiNbO3 films ? It is 
> hard to etch so higher platen power is needed to enhance physical 
> sputtering. What is the impact on etch rate of other processes like 
> etching of Si, SiO2, SiN, etc. in the same chamber ?  How often is 
> chamber liner needed to be scrubbed clean ? Will it shorten the life 
> of turbo pump ?
>
> Thank You,
>
> Paul S. Horng, Ph.D
>
> Process Engineer, UD NanoFab
>
> 457 ISE Lab
>
> 221 Academy Street, Newark, DE 19716
>
> (302)831-4827
>
> http://udnf.udel.edu
>
>
>
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