[labnetwork] STS Multiplex DRIE

[Geil, Bob]

I second that.  Pascal is great.

________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Matthias Pleil <mpleil at unm.edu>
Sent: Monday, July 30, 2018 12:22:10 PM
To: proma016 at fiu.edu; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] STS Multiplex DRIE


Hello,


We have had good luck with the following fellow, Pascal Bouvron for our Alcatel DRIE.

"BOUVRON FIELD SERVICES, LLC"
Address               4397 Norris road
                                Fremont, CA 94536, USA
Cell                         +(1) 510.599.5203<tel:%2B%281%29%20510.599.5203>
Office                    +(1) 510.257.4246<tel:%2B%281%29%20510.257.4246>
Fax                         +(1) 610.870.3762<tel:%2B%281%29%20610.870.3762>
Email                     pascal at bouvronfieldservices.com<mailto:pascal at bouvronfieldservices.com>
LinkedIn               https://www.linkedin.com/in/pascal-bouvron-2487621

[https://static.licdn.com/scds/common/u/images/themes/katy/ghosts/person/ghost_person_200x200_v1.png]<https://www.linkedin.com/in/pascal-bouvron-2487621>

Pascal Bouvron | LinkedIn<https://www.linkedin.com/in/pascal-bouvron-2487621>
www.linkedin.com
View Pascal Bouvron’s profile on LinkedIn, the world's largest professional community. Pascal has 6 jobs listed on their profile. See the complete profile on LinkedIn and discover Pascal’s connections and jobs at similar companies.





Kind Regards,

Matthias Pleil, Ph.D.
Research Professor & Lecturer III of Mech. Eng - UNM
UNM MTTC Cleanroom Manager
PI - Southwest Center for Microsystems Education, Support Center for Microsystems Education
scme-nm.org, scme-support.org
(505)272-7157
________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of proma016 at fiu.edu <proma016 at fiu.edu>
Sent: Friday, July 27, 2018 3:30:33 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] STS Multiplex DRIE

Greetings labnetwork

Can someone recommend an FSE for starup and service of an early model STS DRIE bosch process Si etcher?

Sent from my iPhone

On Jul 26, 2018, at 10:06 PM, Paolini, Steven <spaolini at cns.fas.harvard.edu<mailto:spaolini at cns.fas.harvard.edu>> wrote:


Both are great systems. We like our Oxford Cobra ICP so much that we bought its sister system in ICPCVD. We have a Plasmatherm Versaline system that runs flawlessly as well. In my 35 years of experience, these systems Represent the best in class for university work.

I can’t think of any cons with either platform.



Steve Paolini

Equipment Dood

Harvard University Center for Nanoscale Systems.



Steve Paolini

Principal Equipment Engineer

Harvard University Center for Nanoscale Systems

11 Oxford St.

Cambridge, MA 02138

617- 496- 9816

spaolini at cns.fas.harvard.edu<mailto:spaolini at cns.fas.harvard.edu>

www.cns.fas.harvard.edu<http://www.cns.fas.harvard.edu>



From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Chen, Jun
Sent: Thursday, July 26, 2018 12:51 PM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Experience on ICP-RIE



Dear Colleagues,

We plan to purchase two ICP-RIE systems(Chlorine and Fluorine) recently. Currently we get quote from Oxford Instruments PlasmaPro 100 Cobra300 and  Plasma-Therm Apex SLR ICP.

Does anyone have experience on these systems? What’s the pros and cons?  I would greatly appreciate for your feedback!



best,

Jun Chen, Ph.D.
Nanofabrication scientist,
Petersen Institute of NanoScience and Engineering, and Department of Electrical and Computer Engineering | University of Pittsburgh
3700 O'Hara Street, Pittsburgh, PA 15261
T: 412.383.3282
http://www.nano.pitt.edu/<https://urldefense.proofpoint.com/v2/url?u=http-3A__www.nano.pitt.edu_&d=DwMF-g&c=WO-RGvefibhHBZq3fL85hQ&r=-H4Z_jeDfTYjnKPXor15vLwzBllmg8gFrb9m_k9OGks&m=rcBR73_HmJ1YnlhPiz3lpHV6zNZE8DiWyvDcNaBXmLA&s=7UtitOhQns4HNOjOgtfXCIyh2ehYIdyHyMWZTAwp9lM&e=>





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