[labnetwork] PECVD/RIE - One-piece aluminum chamber or welded stainless steel

[James P McVittie]

Xin,


One normally does not want a plasma in contact with a stainless steel chamber wall.   Typically, there is a plasma potential of around 15V  between the plasma and a grounded wall.  Ion bombardment of the wall will result is some sputtering of the surface of the wall.  Fe and Ni from SS can be a problem for Si devices.

There are several ways to get around sputtering from an SS chamber wall. These include using Al shields on the wall,  using a magnetic electron reflector (alternating N/S magnets around the outside of the wall) or using a glass cylinder between the wall and the wafer.  I hope this is helpful.


    Jim


James (Jim) McVittie, Ph.D.

Senior Research Engineer

Electrical Engineering

Stanford University

336x Paul G. Allen Bldg

420 Via Palou Mall

Stanford, CA 94305

mcvittie at stanford.edu

650-725-3640


________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Xin (Shane) Guo <sguo18 at yorku.ca>
Sent: Wednesday, October 24, 2018 6:14 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] PECVD/RIE - One-piece aluminum chamber or welded stainless steel

Dear colleagues

We are going to buy an RIE/PECVD system. Some vendors offer one-piece aluminum chambers while others offer welded stainless steel.

I understand that one-piece metal is good for keeping the vacuum, but which is more important (one-piece aluminum vs. welded stainless steel), if we have to choose one configuration?

Any suggestions and insights are highly welcome.

Shane
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