[labnetwork] ITO deposition

[Matthew Oonk]

We are like everyone else:   we regularly deposit ITO in a shared system
(Lesker Lab-18 loadlock, 5 sources, turbo pumped tool.)       The best
"as-deposited" film in terms of transmission and resitivity is ~300C with a
tiny bit of O2 (2-4%)    Our sputter tool heats/cools so slowly that most
users just do 2.5% at room temp and either anneal it (if their substrate
allows) or live with the results as-deposited.    We do DC but when I
started up the tool 10 years ago I did RF and it was similar (our old
sputter tool we did RF.)

    Any amount of annealing helps the film - even a hotplate at 180C can
lower the resistivity.   Ours is a tiny bit O2 rich so 450C + FG RTP was
the best for us.

  -Matt
Matthew Oonk
Research Engineer
Lurie Nanofabrication Facility
University of Michigan
734-646-1275
mwoonk at umich.edu


On Thu, Apr 11, 2019 at 7:45 AM Shimon Eliav <shimonel at savion.huji.ac.il>
wrote:

> Hi Iulian,
>
> We have a multi target, multi user Sputtering System. We do ITO deposition
> with no problem.
> From our experience we recommend you "to go easy" on power (DC or RF) in
> order not to melt the Indium bonding to the Copper Back Plate or to crack
> the ITO target itself.
> Regards,
>
> Shimon
> The Hebrew University of Jerusalem
> The Unit for Nano Fabrication
> ISRAEL
>
> -----Original Message-----
> From: labnetwork-bounces at mtl.mit.edu [mailto:
> labnetwork-bounces at mtl.mit.edu] On Behalf Of Iulian Codreanu
> Sent: Tuesday, 9 April 2019 19:55
> To: Fab Network <labnetwork at mtl.mit.edu>
> Subject: [labnetwork] ITO deposition
>
> Dear Colleagues,
>
> We have received a number of requests to provide ITO deposition
> capabilities. We have a sputterer but are concerned with the low melting
> points for Indium and Tin.  I am under the impression that ITO needs a
> dedicated deposition system. What is your experience/advice?
>
> Thank you,
>
> Iulian
>
> --
> iulian Codreanu, Ph.D.
> Director of Operations, Nanofabrication Facility University of Delaware
> Harker ISE Lab, Room 163
> 221 Academy Street
> Newark, DE 19716
> 302-831-2784
> http://udnf.udel.edu
>
>
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