[labnetwork] WG: Blistering of metal film stack on PMMA in Univex 400

[Albrecht, Wolfgang]

Hi Bernd,

we assumed that secondary or stray electrons cause the effect. A measurement of the resist temperature during evaporation is complicated and we failed, but cooling the samples helps. There is a tendency that the effect increases with lowering the deposition rates. With a self-made magnetic trap we were able to drastically reduce the blistering. As it was a new device, we complained to Leybold and Ferrotec. Both were not aware of the effect. Ferrotec understood the problem and retrofitted the sources with magnetic traps. Since we had the same effect in another system (Balzers PLS 570) lowering the deposition rates, we also retrofitted the magnetic traps there.

Best Regards

Wolfgang

Wolfgang Albrecht
Director Helmholtz Nano Facility

Forschungszentrum Juelich
Leo-Brandt Straße
52425 Jülich
Tel.: + 49 2461 61 6364
Fax: +49 2461 61 96418
Email: w.albrecht at fz-juelich.de<mailto:w.albrecht at fz-juelich.de>
http://www.hnf.fz-juelich.de


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