[labnetwork] WG: Blistering of metal film stack on PMMA in Univex 400

[Mike Young]

Would anyone like to describe their "self-made" magnetic traps? I'm 
having trouble envisioning what these might look like. Thanks!

--Mike

On 2/2/2019 6:08 PM, Albrecht, Wolfgang wrote:
> Hi Bernd,
>
> we assumed that secondary or stray electrons cause the effect. A measurement of the resist temperature during evaporation is complicated and we failed, but cooling the samples helps. There is a tendency that the effect increases with lowering the deposition rates.*With a self-made magnetic trap we were able to drastically reduce the 
> blistering*. As it was a new device, we complained to Leybold and Ferrotec. Both were not aware of the effect. Ferrotec understood the problem and retrofitted the sources with magnetic traps. Since we had the same effect in another system (Balzers PLS 570) lowering the deposition rates, we also retrofitted the magnetic traps there.
>
> Best Regards
>
> Wolfgang
>
> Wolfgang Albrecht
> Director Helmholtz Nano Facility
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-- 
Michael P. Young                        (574) 631-3268 (office)
Nanofabrication Specialist              (574) 631-4393 (fax)
Department of Electrical Engineering    (765) 637-3784 (cell)
University of Notre Dame                 mike.young at nd.edu
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