[labnetwork] Fw: Sputtering HfO2

[Mark Hofheins]

Mark Hofheins

mhofheins at unm.edu<mailto:mhofheins at unm.edu>

Cell  505-710-3527

Office 505-272-7155



Micro Electronics Technician

Manufacturing Engineering

University of New Mexico MTTC

800 Bradbury S.E.  Suit 169

Albuquerque, New Mexico

87106-4346



________________________________
From: Mark Hofheins <mhofheins at unm.edu>
Sent: Friday, July 19, 2019 7:03 AM
To: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu>
Cc: Matthias Pleil <mpleil at unm.edu>
Subject: Sputtering HfO2


Good morning everyone,

I have a researcher who wants to sputter SiO2, Ta205, and HfO2.

I do not have knowledge of sputtering HfO2.

My concerns are safety and contamination.

I welcome any and all advice, cautions and other peoples experience with this material.

I am very hesitant and wary of anything with Hf.

Best regards,


Mark Hofheins

mhofheins at unm.edu<mailto:mhofheins at unm.edu>

Cell  505-710-3527

Office 505-272-7155



Micro Electronics Technician

Manufacturing Engineering

University of New Mexico MTTC

800 Bradbury S.E.  Suit 169

Albuquerque, New Mexico

87106-4346

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