[labnetwork] SU-8 in a DRIE

[Shimon Eliav]

Hi Kurt,
We tried to use SU8 instead of photo resist and the results were not satisfactory: there were residues on Si surface (something like black Silicon) and the chamber was quite dirty. We discontinued the experiments.
Regards,
Shimon
Hebrew University of Jerusalem

Sent from my iPhone

On 8 May 2019, at 0:24, Kurt Kupcho <kurt.kupcho at wisc.edu<mailto:kurt.kupcho at wisc.edu>> wrote:

Labnetwork -

We have been asked to allow SU-8 in our DRIE.  I am reluctant to do so because of reports I have read that SU-8 contaminates ICP etch chambers worse than regular photoresist and it can produce antimony contaminants on the surface from the SU-8.

Do any of you have experience in allowing SU-8 in your DRIE or denying it?  What was your decision based on?

Thank you for your help.


-          Kurt


---------------------------------------------------
Kurt Kupcho
Process Engineer/Safety Officer

NFC
1550 Engineering Drive
ECB Room 3110
Madison, WI  53706

E:  kurt.kupcho at wisc.edu<mailto:kurt.kupcho at wisc.edu>
T:  608-262-2982

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