[labnetwork] Gas exhaust

[Shimon Eliav]

Hi Shane,

We have two separate systems with separate vacuum pumps. The exhaust lines are separated.
For the PECVD the exhaust line is made of Stainless Steel. For the ICP-RIE it is made of PPS.
Both system are equipped with dry pumps. During process there is a N2 flow of 30 l/min going through the pumps, so it dilutes the waste gases going to exhaust. Both systems are running for more about ten years with no incident.

Regards,

Shimon
The Hebrew University of Jerusalem
The Unit for Nano Fabrication

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Xin (Shane) Guo
Sent: Wednesday, 6 November 2019 16:01
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Gas exhaust

Hi Colleagues,

We are trying to set up a dual chamber PECVD-RIE system. Our internal team has concerns of mixed fumes sharing the same exhaust. The gases involve NH3(in a gas cabinet), N2, O2, Ar, He, SF6, CHF3, CF4, TEOS and DES (vapor draw), though it should be only traces of the waste gases going into the exhaust.

Can you share what your practice is in your facility? Do you use separate exhaust for different groups of gases? What is the best place to find the guideline or regulation of such thing?

Best

Shane
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