[labnetwork] e-beam evaporation after e-beam lithography

[Hathaway, Malcolm R]

Hi Pradnya,

I'm not an expert in these areas, but a similar issue arose some time ago on labnetwork.  Your situation could be related to electron emissions from the evaporator melt re-exposing or affecting the e-beam resist during the e-beam evaporation run.  There are e-beam evaporator setups which incorporate an "electron filter" to sweep the electrons out of the deposition path, so they can't effect the e-beam resist.

Others will no doubt weigh in shortly, with more specific details.


Mac
Mac Hathaway
Senior Process and Systems Engineer
Harvard Center for Nanoscale Systems
11 Oxford St.
Cambridge, MA  02138
617-495-9012


On 11/15/2019 7:08 AM, Pradnya Chabbi wrote:
Dear all,
We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated.
This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the root cause. Attaching an image below

Has anyone else faced similar problems?
Did you manage to troubleshoot the issue and find a solution?
Kindly let us know.


[image.png]

--
Thanks & regards
Pradnya
-------------------------------------------
Process Technologist,
CEN, IITBNF, Electrical Engg Dept, Annexe,
IIT Bombay, Mumbai, Powai- 400076
Contact - 09420391187(M)



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