[labnetwork] e-beam evaporation after e-beam lithography

Aju Jugessur Aju.Jugessur at Colorado.EDU
Fri Nov 15 11:54:46 EST 2019


Pradnya,

This is a common issue. Are you using Ebeam evaporation to coat the ebeam resist coated samples?
If yes, the scattered electrons may be exposing your ebeam resist as well, resulting in what you observe on your samples.

Aju

Aju Jugessur Ph.D. IEEE Sr. Member
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From: <labnetwork-bounces at mtl.mit.edu> on behalf of Pradnya Chabbi <pradnya.chabbi at gmail.com>
Date: Friday, November 15, 2019 at 5:57 AM
To: "labnetwork at mtl.mit.edu" <labnetwork at mtl.mit.edu>
Subject: [labnetwork] e-beam evaporation after e-beam lithography

Dear all,
We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated.
This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the root cause. Attaching an image below

Has anyone else faced similar problems?
Did you manage to troubleshoot the issue and find a solution?
Kindly let us know.


[cid:image003.png at 01D59B9A.B649B3D0]

--
Thanks & regards
Pradnya
-------------------------------------------
Process Technologist,
CEN, IITBNF, Electrical Engg Dept, Annexe,
IIT Bombay, Mumbai, Powai- 400076
Contact - 09420391187(M)
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