[labnetwork] [ICP-RIE] low temperature pseudo-Bosch process

[Gloria Qiu]

Dear all,

We have received requests to run the pseudo-Bosch (SF6+C4F8) process at -5C to -50C on Oxford ICP-RIE 100s and I am very concerned because:

  *   Oxford suggests to run it at >5C since condensation might affect pumping speed;
  *   The C4F8 in the process might condense on the sample in low temperature;
  *   As I understand the cryogenic Si etch uses SF6+O2, not the C4F8.
I am wondering if you have any experience running this process in low temperatures, below zero degree in particular.

Any comment is appreciated.

Thank you & stay safe.



Best,

Gloria

Wenlan (Gloria) Qiu
Senior Process Engineer | Research & Prototype Foundry
Core Research Facilities | Research Portfolio

THE UNIVERSITY OF SYDNEY
Level 4, Sydney Nanoscience Hub A31 | The University of Sydney | NSW | 2006
M +61 452 493328
E gloria.qiu at sydney.edu.au<mailto:gloria.qiu at sydney.edu.au>  | W Research and Prototype Foundry<https://sydney.edu.au/research/facilities/research-and-prototype-foundry.html>


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