[labnetwork] ALD availability in the midwest

[Edmond Chow]

Hi,

We can help you at University of Illinois.We can do AlOx, HfOx and SiOx.
Sending your samples for us to do deposition is probably the easiest and
fastest option.

You can contact me directly at echow at illinois.edu

Edmond

On Mon, Aug 10, 2020 at 11:13 AM Shepard, Jeremiah J <jshepar at purdue.edu>
wrote:

> All,
> Good morning!  I am an engineer with Purdue's Birck Nanotechnology fab.
> Our ALD system has went down and will be down for several weeks.  I am
> looking for alternatives for our researchers to use until our system comes
> back online.  We are located in West Lafayette, Indiana and options would
> need to be within a few hours driving distance of our location, or provide
> the service through mail.
>
> Our system is equipped with AlOx, HfOx,  and SiOx.  The majority of our
> users are growing AlOx and HfOx.  We have many users interested in low temp
> growths at 90 to 110 C and we have a limit of 50 nm film thickness.  We
> also have many users growing at more traditional 200 C temps.  I would
> expect work coming from our fab to fall within these parameters.
>
> Any leads would be greatly appreciated!
>
> Thank you,
> Jerry Shepard
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>


-- 
Edmond Chow
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20200810/b30b534e/attachment.html>