[labnetwork] Dry etching Zinc Sulfide and/or Zinc Selenide bulk samples

[Shepard, Jeremiah J]

Thank you all for your input, it helps and I greatly appreciate it!

Jerry

From: Kevin Owen <kjvowen at lnf.umich.edu>
Sent: Friday, February 14, 2020 9:00 AM
To: demis at ucsb.edu
Cc: Shepard, Jeremiah J <jshepar at purdue.edu>; labnetwork at mtl.mit.edu; Raghunathan, Nithin <nithin at purdue.edu>; Dilley, Neil R <ndilley at purdue.edu>
Subject: Re: [labnetwork] Dry etching Zinc Sulfide and/or Zinc Selenide bulk samples

I would expect that a CCP may be less susceptible to process shift in this case, at least in my experience redeposition onto a cathode is not nearly as detrimental as onto a coil ceramic (as in the case of ICP). And as was already mentioned, it's unlikely to be completely volatile.

I'll also add that at the LNF, we decided a few years ago that we would not allow any selenides into any system that has a fluorine gas plumbed. Selenium fluorides are highly toxic (SeF6 has an IDLH of 2 ppm), and we were concerned that even if the gas isn't used in that specific etch, in theory there could be reactions with any fluorinated chamber wall deposition from a previous process. This may be overkill (and I'm curious what others think), but that was the decision we made.

We'll be moving pretty much all of our chalcogenide processes to our ion mill (as well as all other materials with predominantly nonvolatile etch byproducts).

-Kevin

On Fri, Feb 14, 2020 at 8:00 AM Demis D. John <demis at ece.ucsb.edu<mailto:demis at ece.ucsb.edu>> wrote:
We have a relatively successful recipe which works with both ZnS & ZnSe:
https://wiki.nanotech.ucsb.edu/wiki/index.php/RIE_Etching_Recipes#ZnS_Etching_.28RIE_2.29
– Methane/Hydrogen RIE etch.

This is on one of our older Capacitive RIE systems: https://wiki.nanotech.ucsb.edu/wiki/index.php/RIE_2_(MRC)
We do have some very sensitive etches on this tool, and long ZnS etches did not appear to cause any visible problems to those.
-- Demis

----------------------------------------
           demis at ucsb.edu<mailto:demis at ucsb.edu>
   Process Scientist Manager
 UCSB Nanofabrication Facility<https://www.nanotech.ucsb.edu/>
----------------------------------------



On Thu, Feb 13, 2020 at 5:43 PM Aebersold,Julia W. <julia.aebersold at louisville.edu<mailto:julia.aebersold at louisville.edu>> wrote:
We haven’t etched that material, but any plasma processing with BCL3 we raise the processing temp of the cooling water.  BCL3 loves to condense at room temps, so we take our chiller up to 35 degrees C to make sure it stays in vapor form.  And wrap the gas lines with heat tape.

Cheers!

Julia Aebersold, Ph.D.
Manager, Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY  40292
(502) 852-1572

http://louisville.edu/micronano/

From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>] On Behalf Of Shepard, Jeremiah J
Sent: Wednesday, February 12, 2020 3:42 PM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Cc: Raghunathan, Nithin <nithin at purdue.edu<mailto:nithin at purdue.edu>>; Dilley, Neil R <ndilley at purdue.edu<mailto:ndilley at purdue.edu>>
Subject: [labnetwork] Dry etching Zinc Sulfide and/or Zinc Selenide bulk samples

Does anyone have experience etching Zinc Sulfide and Zinc Selenide?

It appears chemistry would involve BCL3.

My primary concern is chamber contamination, any experience or thoughts?  Thank you in advance!

Thank you,
Jerry Shepard
Research Engineer
Purdue University
Birck Nanotechnology Center

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--
Kevin Owen
Senior Engineer in Research
Operations Group, Lurie Nanofabrication Facility
University of Michigan
(734) 545-4014
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