[labnetwork] RIE Lower Electrode Question

[Rinehart, Sean]

Hi Long,

One metric for how much those scratches actually matter is your helium leak rate with a wafer installed. Do you find it's been drifting up over the years, even with fresh wafers?

Regarding cleaning, if you're comfortable with removing the electrode I would recommend using IPA with a scotch-brite sanding pad (green), then finish with an ultra fine scotch brite polishing pad (gray). I'd recommend against doing this with the electrode installed, as IPA could easily carry debris into the wafer lift/helium cooling channel.

It looks like your system is an Oxford, and they also sell replacement electrodes. We replace ours about once a decade in our Cl2/BCl3 ICP RIE.

Best,


Sean Rinehart (he, him, his)

Assistant Director, Cleanroom Operations

Yale University

________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Chang, Long <lvchang at Central.UH.EDU>
Sent: Friday, July 17, 2020 4:54 PM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: [labnetwork] RIE Lower Electrode Question

Hi All,

The lower electrode to our RIE system has taken quite a bit of abuse over the decade, see photo. There are scratches and pits caused by wafer shards. There’s also a film of something (probably PTFE oil) in the middle.

Does anyone know how these scratches and pits might affect the Bosch Process? Any recommendations for cleaning this up?

Thanks,
Long
[cid:CEAD01E3-468C-431D-A3F3-56276537FAEC at serc.dhcp.e.uh.edu]
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20200720/258c31a0/attachment.html>
-------------- next part --------------
A non-text attachment was scrubbed...
Name: IMG_1386 2.jpeg
Type: image/jpeg
Size: 72565 bytes
Desc: IMG_1386 2.jpeg
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20200720/258c31a0/attachment.jpeg>